Patents by Inventor Anthonius Martinus Cornelis Petrus De Jong
Anthonius Martinus Cornelis Petrus De Jong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9599908Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: October 9, 2015Date of Patent: March 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Patent number: 9289802Abstract: A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.Type: GrantFiled: December 12, 2008Date of Patent: March 22, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Josephus Cornelius Johannes Antonius Vugts, Jacques Cor Johan Van Der Donck, Teunis Cornelis Van Den Dool, Gerrit Oosterhuis
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Publication number: 20160033875Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: October 9, 2015Publication date: February 4, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans JANSEN, Martinus Hendrikus Antonius LEENDERS, Antonius Johannus VAN DER NET, Peter Franciscus WANTEN, Jacques Cor Johan VAN DER DONCK, Robert Douglas WATSO, Teunis Cornelis VAN DEN DOOL, Nadja SCHUH, Jan Willem CROMWIJK
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Patent number: 9158206Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: February 22, 2011Date of Patent: October 13, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Patent number: 9019466Abstract: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.Type: GrantFiled: September 27, 2007Date of Patent: April 28, 2015Assignee: ASML Netherlands B.V.Inventors: Martinus Hendrikus Antonius Leenders, Youri Johannes Laurentius Maria Van Dommelen, Hans Jansen, Robert Douglas Watso, Anthonius Martinus Cornelis Petrus De Jong, Jan Willem Cromwijk, Thomas Laursen
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Patent number: 9013672Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: GrantFiled: June 29, 2007Date of Patent: April 21, 2015Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 8947629Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: GrantFiled: April 11, 2008Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 8823918Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: GrantFiled: April 22, 2009Date of Patent: September 2, 2014Assignee: ASML Netherlands B.V.Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
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Patent number: 8339572Abstract: Contaminants may build up on surfaces of an immersion lithographic apparatus that come into contact with an immersion liquid from during exposure of a substrate. A solution containing a cleaning agent may be used to clean such surfaces. The cleaning properties of such a cleaning solution may be improved by activating it with ultraviolet radiation. This means that a solution of a lower concentration may be used, thereby reducing the risk of damaging the surfaces to which the cleaning solution is provided. An embodiment of the present invention allows ultraviolet radiation to be provided to surfaces being cleaned without having to take the apparatus off-line. In an embodiment, a guide member is used to transfer ultraviolet radiation from a remote radiation source to an outlet located at a position where it is desired for a cleaning operation.Type: GrantFiled: January 22, 2009Date of Patent: December 25, 2012Assignee: ASML Netherlands B.V.Inventor: Anthonius Martinus Cornelis Petrus De Jong
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Publication number: 20110292359Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: August 4, 2011Publication date: December 1, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 8011377Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: GrantFiled: April 11, 2008Date of Patent: September 6, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marlus Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20110188013Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: February 22, 2011Publication date: August 4, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Patent number: 7916269Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: September 27, 2007Date of Patent: March 29, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Publication number: 20110069290Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: ApplicationFiled: December 1, 2010Publication date: March 24, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Bauke JANSEN, Raymond Gerardus Marius Beeren, Anthonius Martinus, Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Patent number: 7900641Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: GrantFiled: June 29, 2007Date of Patent: March 8, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 7866330Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: GrantFiled: April 11, 2008Date of Patent: January 11, 2011Assignee: ASML Netherlands B.V.Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Patent number: 7841352Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: GrantFiled: June 29, 2007Date of Patent: November 30, 2010Assignee: ASML Netherlands B.V.Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Publication number: 20100097587Abstract: A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt % surfactant.Type: ApplicationFiled: October 20, 2009Publication date: April 22, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Jacques Cor Johan Van Der Donck, Harrie Gorter, Johannes Hendrik Van Der Berg
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Publication number: 20090284715Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: ApplicationFiled: April 22, 2009Publication date: November 19, 2009Applicant: ASML NETHERLAND B.V.Inventors: Robert Douglas Watso, Youri Johannes Laurentius Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
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Publication number: 20090190105Abstract: Contaminants may build up on surfaces of an immersion lithographic apparatus that come into contact with an immersion liquid from during exposure of a substrate. A solution containing a cleaning agent may be used to clean such surfaces. The cleaning properties of such a cleaning solution may be improved by activating it with ultraviolet radiation. This means that a solution of a lower concentration may be used, thereby reducing the risk of damaging the surfaces to which the cleaning solution is provided. An embodiment of the present invention allows ultraviolet radiation to be provided to surfaces being cleaned without having to take the apparatus off-line. In an embodiment, a guide member is used to transfer ultraviolet radiation from a remote radiation source to an outlet located at a position where it is desired for a cleaning operation.Type: ApplicationFiled: January 22, 2009Publication date: July 30, 2009Applicant: ASML NETHERLANDS B.V.Inventor: Anthonius Martinus Cornelis Petrus DE JONG