Abstract: A clamp assembly is for clamping an outer peripheral portion of a substrate to a support in a plasma processing chamber. An RF bias power is applied to the support during the plasma processing of the substrate. The clamp assembly includes an outer clamp member, and an inner clamp member which is received by the outer clamp member, the inner clamp member defining an aperture which exposes the substrate to the plasma processing. The outer clamp member has an inner portion terminating in an inner edge, wherein the inner portion is spaced apart from the inner clamp member.

Abstract: A method of treating soil, the method comprising providing the soil with a glucosinolate-secreting plant or a source thereof and contacting said soil with a myrosinase-secreting yeast of the x or a source thereof.

Abstract: A method of treating soil, the method comprising providing the soil with a glucosinolate-secreting plant or a source thereof and contacting said soil with a myrosinase-secreting microorganism or a source thereof.

Abstract: A compact electric vehicle supply equipment tester that performs a comprehensive range of electrical safety and functional tests to measure the performance characteristics of an electric vehicle supply equipment charging station (EVSE). The hand-held, light weight, easy to use tester provides circuitry that simulates the presence of an electric vehicle and provides unique diagnostic capability to identify and determine the cause of EVSE system failures using application software for the electric vehicle supply equipment tester that provides for collected data to be transmitted using a wireless communications interface to provide real-time, remote access and control of the tester to monitor and review test data and fault conditions to assist in fault diagnosis, maintenance, and repair of an EVSE.

Abstract: A clamp assembly is for clamping an outer peripheral portion of a substrate to a support in a plasma processing chamber. An RF bias power is applied to the support during the plasma processing of the substrate. The clamp assembly includes an outer clamp member, and an inner clamp member which is received by the outer clamp member, the inner clamp member defining an aperture which exposes the substrate to the plasma processing. The outer clamp member has an inner portion terminating in an inner edge, wherein the inner portion is spaced apart from the inner clamp member.

Abstract: A method of plasma etching a silicon carbide workpiece includes forming a mask on a surface of the silicon carbide workpiece, performing an initial plasma etch on the masked surface using a first set of process conditions, wherein the plasma is produced using an etchant gas mixture which includes i) oxygen and ii) at least one fluorine rich gas which is present in the etchant gas mixture at a volume ratio of less than 50%, and subsequently performing a bulk plasma etch process using a second set of process conditions which differ from the first set of process conditions.

Abstract: a method of plasma etching a silicon carbide workpiece includes forming a mask on a surface of the silicon carbide workpiece, performing an initial plasma etch on the masked surface using a first set of process conditions, wherein the plasma is produced using an etchant gas mixture which includes i) oxygen and ii) at least one fluorine rich gas which is present in the etchant gas mixture at a volume ratio of less than 50%, and subsequently performing a bulk plasma etch process using a second set of process conditions which differ from the first set of process conditions.

Abstract: A magnetic coil inductor for use in magnetic stimulators comprises two face-to-face electrically connected windings each having a multiplicity of turns of a respective conductor. Corresponding turns are separated by a gap which typically is of the order of 18 to 20% of the total height of the coil. The magnetic stimulator includes a discharge capacitor and a switch arrangement operable to provide discharge pulses at a selected repetition rate through the inductor, the inductor and the capacitor constituting a resonant circuit of which the resonant frequency is substantially in excess of the repetition rate and is typically between 2 and 6 kHz.