Patents by Inventor Anthony CT Chan

Anthony CT Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Target sidewall design to reduce particle generation during magnetron sputtering
    Patent number: 6620296
    Abstract: An apparatus for a physical vapor deposition system includes a target having a sidewall having an undercut thereon defining a net erosion area and a net redeposition area.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: September 16, 2003
    Assignee: Applied Materials, Inc.
    Inventors: James Van Gogh, Jim Thompson, Marc Schweitzer, Yoichiro Tanaka, Alan Liu, Anthony CT Chan, Karl Brown, John C. Forster
  • Target sidewall design to reduce particle generation during magnetron sputtering
    Publication number: 20020121436
    Abstract: An apparatus for a physical vapor deposition system includes a target having a sidewall having an undercut thereon defining a net erosion area and a net redeposition area.
    Type: Application
    Filed: July 13, 2001
    Publication date: September 5, 2002
    Applicant: APPLIED MATERIALS, INC.
    Inventors: James Van Gogh, Jim Thompson, Marc Schweitzer, Yoichiro Tanaka, Alan Liu, Anthony CT Chan, Karl Brown, John C. Forster