Patents by Inventor Anthony Canize

Anthony Canize has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
    Patent number: 5612164
    Abstract: A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.
    Type: Grant
    Filed: February 9, 1995
    Date of Patent: March 18, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Anthony Canize, Stanley A. Ficner, Ping-Hung Lu, Walter Spiess
  • Novolak resin mixtures
    Patent number: 5371169
    Abstract: The present invention provides mixture of at least two novolak resins with a molecular weight distribution overlap of at least 50% and having dissolution rates which differ by a factor of at least 2.0. A method is also provided for producing such novolak resin mixtures.
    Type: Grant
    Filed: September 28, 1992
    Date of Patent: December 6, 1994
    Assignee: Hoechst Celanese Corporation
    Inventors: Ping H. Lu, Anthony Canize, Dinesh N. Khanna, M. Dalil Rahman