Abstract: Disclosed systems and methods relate to a power efficient voltage level translator. In a normal mode wherein a first supply voltage of the first voltage domain and a second supply voltage of the second voltage domain are different, the voltage level translator translates an input signal in a first voltage domain to an output signal in a second voltage domain. In a bypass mode wherein the first supply voltage and the second supply voltage are substantially the same, a bypass circuit is configured to bypass the voltage level translator and provide the input signal as the output signal in the first voltage domain, thus avoiding delay introduced by the voltage level translator in the bypass mode. Further, a power-down circuit is configured to power-down the voltage level translator in the bypass mode but not in the normal mode.

Abstract: Aspects disclosed in the detailed description include integrated circuit (IC) design methods using engineering change order (ECO) cell architectures. In particular, exemplary aspects provide a fill algorithm that is both single- and multi-row aware, considers a poly-pitch count, and utilizes metallization of the “empty space” relative to a suite of available fill cells. The algorithm is also aware of timing critical logic elements and may place ECO fill cells in near proximity to such timing sensitive circuits or other margin critical circuits to allow for decoupling or, if there is a logic error, an ECO cell is placed such that the ECO cell is well positioned to be repurposed as a delay circuit or other function to aid in margin control. For maximum flexibility, the algorithm may also address both pre- and post-route applications.

Abstract: Power distribution networks (PDNs) using hybrid grid and pillar arrangements are disclosed. In particular, a process for designing an integrated circuit (IC) considers various design criteria when placing and routing the PDN for the IC. Exemplary design criteria include switching frequencies, current densities, and decoupling capacitance and their impact on temperature. In areas of high localized temperature, a power grid structure is used. In other areas, shared metal track pillars may be used. By mixing power grids with pillars, the IC may reduce local hotspots by allowing the grid to help dissipate heat and assist with decoupling capacitance while at the same time providing pillars in areas of high current density to reduce resistive losses.

Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.

Abstract: Power distribution networks (PDNs) using hybrid grid and pillar arrangements are disclosed. In particular, a process for designing an integrated circuit (IC) considers various design criteria when placing and routing the PDN for the IC. Exemplary design criteria include switching frequencies, current densities, and decoupling capacitance and their impact on temperature. In areas of high localized temperature, a power grid structure is used. In other areas, shared metal track pillars may be used. By mixing power grids with pillars, the IC may reduce local hotspots by allowing the grid to help dissipate heat and assist with decoupling capacitance while at the same time providing pillars in areas of high current density to reduce resistive losses.

Abstract: Aspects disclosed in the detailed description include integrated circuit (IC) design methods using engineering change order (ECO) cell architectures. In particular, exemplary aspects provide a fill algorithm that is both single- and multi-row aware, considers a poly-pitch count, and utilizes metallization of the “empty space” relative to a suite of available fill cells. The algorithm is also aware of timing critical logic elements and may place ECO fill cells in near proximity to such timing sensitive circuits or other margin critical circuits to allow for decoupling or, if there is a logic error, an ECO cell is placed such that the ECO cell is well positioned to be repurposed as a delay circuit or other function to aid in margin control. For maximum flexibility, the algorithm may also address both pre- and post-route applications.

Abstract: Engineering change order (ECO) cell architecture and implementation is disclosed. In particular, exemplary aspects disclosed herein provide a generic cell structure that may be readily modified to effect an ECO without requiring extensive mask changes beyond one or two levels including the level in which the cell is located. Further, this generic cell structure can be “parked” fairly deep in the manufacturing process, such as in the middle-end-of-line (MEOL), so that fewer changes to other masks are needed in the event of a change. The generic cell may further act as a filler cell for pattern density. Inclusion of such a generic cell in a circuit design can help alleviate the need for extensive mask redesign and accompanying delays in the production of finished silicon.

Abstract: Systems and methods relate to cell placement methodologies for improving length of diffusion of transistors. For example, a first transistor with a first diffusion node which is bounded by a first diffusion cut is identified in a transistor level layout. The first diffusion cut is replaced with a first floating gate, and a first filler cell with a first filler diffusion region is added to extend a length of diffusion of the first diffusion node. Increasing the length of diffusion leads to improving drive strength and performance of the first transistor.

Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.

Abstract: Complementary metal oxide semiconductor (MOS) (CMOS) standard cell circuits employing metal lines in a first metal layer used for routing, and related methods are disclosed. In one aspect, a CMOS standard cell circuit includes first supply rail, second supply rail, and metal lines disposed in the first metal layer. One or more of the metal lines are dynamically cut corresponding to a first cell boundary and a second cell boundary of the CMOS standard cell such that the metal lines have cut edges corresponding to the first and second cell boundaries. Metal lines not cut corresponding to the first and second cell boundaries can be used to interconnect nodes of the CMOS standard cell circuit. Dynamically cutting the metal lines allows the first metal layer to be used for routing, reducing routing in other metal layers such that fewer vias and metal lines are disposed above the first metal layer.

Abstract: Systems and methods relate to cell placement methodologies for improving length of diffusion of transistors. For example, a first transistor with a first diffusion node which is bounded by a first diffusion cut is identified in a transistor level layout. The first diffusion cut is replaced with a first floating gate, and a first filler cell with a first filler diffusion region is added to extend a length of diffusion of the first diffusion node. Increasing the length of diffusion leads to improving drive strength and performance of the first transistor.

Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.

Abstract: Disclosed systems and methods pertain to finfet based integrated circuits designed with logic cell architectures which support multiple diffusion regions for n-type and p-type diffusions. Different diffusion regions of each logic cell can have different widths or fin counts. Abutting two logic cells is enabled based on like fin counts for corresponding p-diffusion regions and n-diffusion regions of the two logic cells. Diffusion fills are used at common edges between the two logic cells for extending lengths of diffusion, based on the like fin counts. The logic cell architectures support via redundancy and the ability to selectively control threshold voltages of different logic cells with implant tailoring. Half-row height cells can be interleaved with standard full-row height cells.

Abstract: Disclosed systems and methods relate to a power efficient voltage level translator. In a normal mode wherein a first supply voltage of the first voltage domain and a second supply voltage of the second voltage domain are different, the voltage level translator translates an input signal in a first voltage domain to an output signal in a second voltage domain In a bypass mode wherein the first supply voltage and the second supply voltage are substantially the same, a bypass circuit is configured to bypass the voltage level translator and provide the input signal as the output signal in the first voltage domain, thus avoiding delay introduced by the voltage level translator in the bypass mode. Further, a power-down circuit is configured to power-down the voltage level translator in the bypass mode but not in the normal mode.

Abstract: Embodiments that design integrated circuits using a 1×N compiler in a closed-loop 1×N methodology are disclosed. Some embodiments create a physical design representation based on a behavioral representation of a design for an integrated circuit. The behavioral representation may comprise RTL HDL with one or more 1×N building blocks. The embodiments may alter elements of the 1×N building block by using logic design tools, synthesis tools, physical design tools, and timing analysis tools. Further embodiments comprise an apparatus having a first generator to generate a behavioral representation of a design for an integrated circuit, a second generator to generate a logical representation of the design, and a third generator to generate a physical design representation of the design, wherein the representation generators may create updated versions of the representations which reflect alterations made to 1×N building block elements.

Abstract: Embodiments that design integrated circuits using a 1×N compiler in a closed-loop 1×N methodology are disclosed. Some embodiments create a physical design representation based on a behavioral representation of a design for an integrated circuit. The behavioral representation may comprise RTL HDL with one or more 1×N building blocks. The embodiments may alter elements of the 1×N building block by using logic design tools, synthesis tools, physical design tools, and timing analysis tools. Further embodiments comprise an apparatus having a first generator to generate a behavioral representation of a design for an integrated circuit, a second generator to generate a logical representation of the design, and a third generator to generate a physical design representation of the design, wherein the representation generators may create updated versions of the representations which reflect alterations made to 1×N building block elements.

Abstract: Embodiments that design integrated circuits using a 1×N compiler in a closed-loop 1×N methodology are disclosed. Some embodiments create a physical design representation based on a behavioral representation of a design for an integrated circuit. The behavioral representation may comprise RTL HDL with one or more 1×N building blocks. The embodiments may alter elements of the 1×N building block by using logic design tools, synthesis tools, physical design tools, and timing analysis tools. Further embodiments comprise an apparatus having a first generator to generate a behavioral representation of a design for an integrated circuit, a second generator to generate a logical representation of the design, and a third generator to generate a physical design representation of the design, wherein the representation generators may create updated versions of the representations which reflect alterations made to 1×N building block elements.

Abstract: Embodiments that design integrated circuits using a 1×N compiler in a closed-loop 1×N methodology are disclosed. Some embodiments create a physical design representation based on a behavioral representation of a design for an integrated circuit. The behavioral representation may comprise RTL HDL with one or more 1×N building blocks. The embodiments may alter elements of the 1×N building block by using logic design tools, synthesis tools, physical design tools, and timing analysis tools. Further embodiments comprise an apparatus having a first generator to generate a behavioral representation of a design for an integrated circuit, a second generator to generate a logical representation of the design, and a third generator to generate a physical design representation of the design, wherein the representation generators may create updated versions of the representations which reflect alterations made to 1×N building block elements.

Abstract: Methods, systems, and media to improve the manufacturability of cells and structures within cells of an integrated circuit are disclosed. Embodiments comprise a method of arranging programmable cells, routing the programmable cells, analyzing the cell arrangement and interconnect wiring for manufacturing improvement opportunities, and modifying the programmable cell structures to incorporate the manufacturing improvements. In some embodiments, wires are spread to prevent shorting. In other embodiments, the reliability of contacts and vias is improved by adding additional metallization to the areas surrounding the contacts and vias, or by adding redundant contacts and vias. In one embodiment, a series of manufacturing improvements are made to integrated circuit cells in an iterative fashion.

Abstract: Techniques for using gate arrays to create capacitive structures within an integrated circuit are disclosed. Embodiments comprise placing a gate array of P-type field effect transistors (P-fets) and N-type field effect transistors (N-fets) in an integrated circuit design, coupling drains and sources for one or more P-fets and gates for one or more N-fets to a power supply ground, and coupling gates for the one or more P-fets and the drains and sources for one or more N-fets to a positive voltage of the power supply. In some embodiments, source-to-drain leakage current for capacitive apparatuses of P-fets and N-fets are minimized by biasing one or more P-fets and one or more N-fets to the positive voltage and the ground, respectively. In other embodiments, the capacitive structures may be implemented using fusible elements to isolate the capacitive structures in case of shorts.