Patents by Inventor Anthony de la Llera
Anthony de la Llera has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8573152Abstract: A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.Type: GrantFiled: September 3, 2010Date of Patent: November 5, 2013Assignee: Lam Research CorporationInventors: Anthony de la Llera, Pratik Mankidy, Michael C. Kellogg, Rajinder Dhindsa
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Patent number: 8470127Abstract: A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.Type: GrantFiled: January 6, 2011Date of Patent: June 25, 2013Assignee: Lam Research CorporationInventors: Anthony de la Llera, Pratik Mankidy, Rajlnder Dhindsa, Michael C. Kellogg, Gregory R. Bettencourt, Roger Patrick
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Publication number: 20130134138Abstract: A gas feed insert configured to be disposed in a passage through an electrode assembly comprising a first insert end having therein a first bore aligned parallel with a linear axis of the gas feed insert. The gas feed insert further includes a second insert end opposite the first insert end, the second insert end having therein a second bore aligned parallel with the linear axis of the gas feed insert and a bore-to-bore communication channel in gas flow communication with the first bore and the second bore. The bore-to-bore communication channel is formed in an outer surface of the gas feed insert so as to prevent a line-of-sight when a gas flows from the first insert end through the bore-to-bore communication to the second insert end.Type: ApplicationFiled: September 14, 2012Publication date: May 30, 2013Inventors: Anthony de la Llera, Michael C. Kellogg, Alexei Marakhtanov, Rajinder Dhindsa
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Publication number: 20130134876Abstract: A plasma processing systems having at least one plasma processing chamber, comprising a movable grounding component, an RF contact component configured to receive RF energy from an RF source when the RF source provides the RF energy to the RF contact component, and a ground contact component coupled to ground. The plasma processing system further includes an actuator operatively coupled to the movable grounding component for disposing the movable grounding component in a first position and a second position. The first position represents a position whereby the movable grounding component is not in contact with at least one of the RF contact component and the ground contact component. The second position represents a position whereby the movable grounding component is in contact with both the RF contact component and the ground contact component.Type: ApplicationFiled: September 14, 2012Publication date: May 30, 2013Inventors: Anthony de la Llera, Michael C. Kellogg, Alexei Marakhtanov, Rajinder Dhindsa
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Patent number: 8419959Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.Type: GrantFiled: September 17, 2010Date of Patent: April 16, 2013Assignee: Lam Research CorporationInventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng., Sandy Chao, Anthony de la Llera, Pratik Mankidy
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Patent number: 8402918Abstract: A showerhead electrode includes inner and outer steps at an outer periphery thereof, the outer step cooperating with a clamp ring which mechanically attaches the electrode to a backing plate.Type: GrantFiled: April 7, 2009Date of Patent: March 26, 2013Assignee: Lam Research CorporationInventors: Babak Kadkhodayan, Anthony de la Llera
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Patent number: 8313805Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.Type: GrantFiled: March 16, 2012Date of Patent: November 20, 2012Assignee: Lam Research CorporationInventors: Babak Kadkhodayan, Rajinder Dhindsa, Anthony de la Llera, Michael C. Kellogg
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Patent number: 8313665Abstract: Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the showerhead electrode at multiple contact points across the backing plate; and at least one thermally and electrically conductive gasket separating the backing plate and the thermal control plate, or the backing plate and showerhead electrode, at the contact points. Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.Type: GrantFiled: November 24, 2010Date of Patent: November 20, 2012Assignee: Lam Research CorporationInventors: Thomas R. Stevenson, Anthony de la Llera, Saurabh Ullal
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Publication number: 20120175062Abstract: A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.Type: ApplicationFiled: January 6, 2011Publication date: July 12, 2012Applicant: Lam Research CorporationInventors: Anthony de la Llera, Pratik Mankidy, Rajinder Dhindsa, Michael C. Kellogg, Gregory R. Bettencourt, Roger Patrick
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Publication number: 20120171872Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.Type: ApplicationFiled: March 16, 2012Publication date: July 5, 2012Applicant: Lam Research CorporationInventors: Babak Kadkhodayan, Rajinder Dhindsa, Anthony de la Llera, Michael C. Kellogg
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Patent number: 8206506Abstract: A showerhead electrode includes inner and outer steps at an outer periphery thereof, the outer step cooperating with a clamp ring which mechanically attaches the electrode to a backing plate.Type: GrantFiled: July 7, 2008Date of Patent: June 26, 2012Assignee: Lam Research CorporationInventors: Babak Kadkhodayan, Rajinder Dhindsa, Anthony de la Llera, Michael C. Kellogg
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Patent number: 8161906Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which includes an inner electrode mechanically attached to a backing plate by a clamp ring and an outer electrode attached to the backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release cam pins extending upward from the upper face of the outer electrode. To compensate for differential thermal expansion, the clamp ring can include expansion joins at spaced locations which allow the clamp ring to absorb thermal stresses.Type: GrantFiled: July 7, 2008Date of Patent: April 24, 2012Assignee: Lam Research CorporationInventors: Babak Kadkhodayan, Rajinder Dhindsa, Anthony de la Llera, Michael C. Kellogg
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Publication number: 20120073754Abstract: A plasma confinement ring assembly with a single movable lower ring can be used for controlling wafer area pressure in a capacitively coupled plasma reaction chamber wherein a wafer is supported on a lower electrode assembly and process gas is introduced into the chamber by an upper showerhead electrode assembly. The assembly includes an upper ring, the lower ring, hangers, hanger caps, spacer sleeves and washers. The lower ring is supported by the hangers and is movable towards the upper ring when the washers come into contact with the lower electrode assembly during adjustment of the gap between the upper and lower electrodes. The hanger caps engage upper ends of the hangers and fit in upper portions of hanger bores in the upper ring. The spacer sleeves surround lower sections of the hangers and fit within lower portions of the hanger bores. The washers fit between enlarged heads of the hangers and a lower surface of the lower ring.Type: ApplicationFiled: February 4, 2011Publication date: March 29, 2012Applicant: Lam Research CorporationInventors: Anthony de la Llera, David Carman, Travis R. Taylor, Saurabh J. Ullal, Harmeet Singh
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Publication number: 20120055632Abstract: A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.Type: ApplicationFiled: September 3, 2010Publication date: March 8, 2012Applicant: Lam Research CorporationInventors: Anthony de la Llera, Pratik Mankidy, Michael C. Kellogg, Rajinder Dhindsa
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Publication number: 20110086513Abstract: Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.Type: ApplicationFiled: December 14, 2010Publication date: April 14, 2011Applicant: Lam Research CorporationInventors: Anthony De La Llera, Allan K. Ronne, Jaehyun Kim, Jason Augustino, Rajinder Dhindsa, Yen-Kun Wang, Saurabh J. Ullal, Anthony J. Norell, Keith Comendant, William M. Denty, JR.
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Publication number: 20110083809Abstract: An inner electrode of a showerhead electrode assembly useful for plasma etching includes features providing improved positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. The assembly can include a thermal gasket set and fasteners such as bolts or cam locks located on a radius of ¼ to ½ the radius of the inner electrode. A method of assembling the inner electrode and gasket set to a supporting member is also provided.Type: ApplicationFiled: October 13, 2010Publication date: April 14, 2011Applicant: Lam Research CorporationInventors: Anthony de la Llera, Pratik Mankidy
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Publication number: 20110081783Abstract: Showerhead electrode assemblies are disclosed, which include a showerhead electrode adapted to be mounted in an interior of a vacuum chamber; an optional backing plate attached to the showerhead electrode; a thermal control plate attached to the backing plate or to the showerhead electrode at multiple contact points across the backing plate; and at least one thermally and electrically conductive gasket separating the backing plate and the thermal control plate, or the backing plate and showerhead electrode, at the contact points. Methods of processing semiconductor substrates using the showerhead electrode assemblies are also disclosed.Type: ApplicationFiled: November 24, 2010Publication date: April 7, 2011Applicant: Lam Research CorporationInventors: Thomas R. Stevenson, Anthony de la Llera, Säurabh Ullal
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Publication number: 20110070740Abstract: An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.Type: ApplicationFiled: September 17, 2010Publication date: March 24, 2011Applicant: Lam Research CorporationInventors: Gregory R. Bettencourt, Gautam Bhattacharyya, Simon Gosselin Eng., Sandy Chao, Anthony de la Llera, Pratik Mankidy
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Publication number: 20110042879Abstract: A cam lock clamp comprises a stud having a substantially cylindrical body with a first end including a head area and a second end arranged to support one or more disc springs concentrically about the stud. A socket is arranged to mechanically couple concentrically around the stud with the head area of the stud being exposed above an uppermost portion of the socket. The socket is configured to be firmly attached to a consumable material. A camshaft has a substantially cylindrical body and is configured to mount within a bore of a backing plate. The camshaft further comprises an eccentric cutout area located in a central portion of the camshaft body. The camshaft is configured to engage and lock the head area of the stud when the consumable material and the backing plate are proximate to one another.Type: ApplicationFiled: March 13, 2009Publication date: February 24, 2011Applicant: Lam Research CorporationInventors: Michael C. Kellogg, Anthony J. Norell, Anthony de la Llera, Rajinder Dhindsa
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Patent number: 7854820Abstract: Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.Type: GrantFiled: December 15, 2006Date of Patent: December 21, 2010Assignee: Lam Research CorporationInventors: Anthony De La Llera, Allan K. Ronne, Jaehyun Kim, Jason Augustino, Rajinder Dhindsa, Yen-Kun Wang, Saurabh J. Ullal, Anthony J. Norell, Keith Comendant, William M. Denty, Jr.