Patents by Inventor Anthony DeFeo

Anthony DeFeo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180306274
    Abstract: A system and method for modifying a stock transmission is provided. The stock transmission includes an existing ring gear and main shaft. A modified gearset is provided, wherein the modified gearset is capable of replacing a stock gearset that includes at least a stock sun gear and at least a stock pinion gear. The modified gearset includes a replacement sun gear, the replacement sun gear having an increased tooth count and an increased diameter as compared to the stock sun gear. The modified gearset further includes a replacement pinion gear, the replacement pinion gear having a decreased tooth count and a decreased diameter as compared to the stock pinion gear. The replacement sun gear and the replacement pinion gear are capable of meshing with the existing ring gear. Accordingly, the stock transmission performance can be modified with minimal modifications to the stock transmission itself.
    Type: Application
    Filed: April 23, 2018
    Publication date: October 25, 2018
    Inventors: Anthony Defeo, Austin Nesser
  • Patent number: 7579418
    Abstract: The present invention relates to the process of extruding melt drawing fluoropolymer onto conductor to form insulated conductor at a line speed of at least 533 m/min and having no more than 10 sparks and no more than 2 lumps/13.7 km of insulated conductor under conditions that comprise an adequate process window to allow for these results to be obtained at different conditions within the process window. The invention identifies the critical parameters for achieving this process window, namely melt flow rate of the fluoropolymer, preferably being 30±3 g/10 min, and the melt temperature of the extruding/melt-drawing step, preferably being 393° C.±6° C.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: August 25, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Patrick Anthony DeFeo, Glenn W. Heffner, Niall D. McKee, Sundar Kilnagar Venkataraman
  • Publication number: 20040232580
    Abstract: The present invention relates to the process of extruding melt drawing fluoropolymer onto conductor to form insulated conductor at a line speed of at least 533 m/min and having no more than 10 sparks and no more than 2 lumps/13.7 km of insulated conductor under conditions that comprise an adequate process window to allow for these results to be obtained at different conditions within the process window. The invention identifies the critical parameters for achieving this process window, namely melt flow rate of the fluoropolymer, preferably being 30±3 g/10 min, and the melt temperature of the extruding/melt-drawing step, preferably being 393° C.±6° C.
    Type: Application
    Filed: April 27, 2004
    Publication date: November 25, 2004
    Inventors: Patrick Anthony Defeo, Glenn W. Heffner, Niall D. Mckee, Sundar Kilnagar Venkataraman
  • Patent number: 6605544
    Abstract: A shield for protecting silicon wafers. The shield includes a plurality of single crystal shielding members having a lattice unit cell repeated substantially throughout. The unit cell has a periodic arrangement of atoms defining a set of lattice planes. The shielding members each include a pair of first interface surfaces having an orientation substantially aligned along one of the set of lattice planes. The shield also includes a plurality of single crystal structural members each having substantially the same lattice unit cell as that of the shielding members repeated substantially throughout. The structural members each include a pair of second interface surfaces having an orientation substantially aligned along the same one of the set of lattice planes. The plurality of shielding members and structural members are alternately bonded together at their respective first and second interface surfaces to define an enclosed area sized to receive the silicon wafers therein.
    Type: Grant
    Filed: November 7, 2001
    Date of Patent: August 12, 2003
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventor: Anthony DeFeo