Patents by Inventor Anthony E. Redpath

Anthony E. Redpath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluorene containing compounds and negative photoresist compositions therefrom
    Patent number: 4663412
    Abstract: Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.
    Type: Grant
    Filed: July 2, 1986
    Date of Patent: May 5, 1987
    Assignee: Ecoplastics Limited
    Inventors: James E. Guillet, Anthony E. Redpath
  • Fluorene containing compounds and negative photoresist compositions therefrom
    Patent number: 4618566
    Abstract: Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.
    Type: Grant
    Filed: October 31, 1984
    Date of Patent: October 21, 1986
    Assignee: Ecoplastics Limited
    Inventors: James E. Guillet, Anthony E. Redpath