Patents by Inventor Anthony K. Quick

Anthony K. Quick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wall deposition thickness sensor for plasma processing chamber
    Patent number: 6025916
    Abstract: A device for measuring polymer build-up on plasma chamber walls provides a cooled window on which a film may form. Light passing through the window outside the chamber may be measured by interferometric techniques to determine change in film thickness and thus indicate when cleaning is required and the success of cleaning operations. A sapphire window may be used to allow for air cooling and to reduce etching by the plasma. A fiber optic cable may communicate the light between the window and measurement electronics.
    Type: Grant
    Filed: October 29, 1998
    Date of Patent: February 15, 2000
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Anthony K. Quick, Moshe Sarfaty, Noah H. Hershkowitz, Perry W. Sandstrom