Abstract: A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.

Abstract: A sterilization system applies power to a plasma within a chamber to remove gas or vapor species from an article. The sterilization system includes a power feedback control system for controlling the power applied to the plasma. The power feedback control system includes a current monitor adapted to produce a first signal indicative of a current applied to the plasma within the chamber. The power feedback control system further includes a voltage monitor adapted to produce a second signal indicative of a voltage applied to the plasma within the chamber. The power feedback control system further includes a power control module comprising a programmable digital signal processor. The digital signal processor is adapted to receive and process the first signal and the second signal by multiplying the current and the voltage and producing a third signal indicative of the product of the current and the voltage.

Abstract: A sterilization system applies power in the form of bipolar pulsed DC to a plasma during a gas/plasma sterilization procedure.

Abstract: A method for sterilizing medical devices and similar instruments in diffusion-restricted containers is provided. The sterilization method includes placing a liquid solution containing vaporizable germicide such as hydrogen peroxide into the diffusion-restricted container and vaporizing the germicide. The containers can be attachable and detachable to a sterilization system, and used as a vacuum chamber. An attachable/detachable container containing an article to be sterilized can be nested with a second container, and the article and inside and outside of the inner container are sterilized. The sterile article inside the nested containers can be transported and the sterile inner container with the sterilized article can removed from the outer container and placed in a sterile environment without contaminating the sterile environment. The sterile article can then be removed from the sterile container and utilized.

Abstract: A sterilization process challenge device has a sterilization indicator contained within a container; and a variable diffusion restriction into said container.

Abstract: A sterilization system applies power to a plasma within a chamber to remove gas or vapor species from an article. The sterilization system includes a power feedback control system for controlling the power applied to the plasma. The power feedback control system includes a current monitor adapted to produce a first signal indicative of a current applied to the plasma within the chamber. The power feedback control system further includes a voltage monitor adapted to produce a second signal indicative of a voltage applied to the plasma within the chamber. The power feedback control system further includes a power control module comprising a programmable digital signal processor. The digital signal processor is adapted to receive and process the first signal and the second signal by multiplying the current and the voltage and producing a third signal indicative of the product of the current and the voltage.

Abstract: The present invention provides a power feedback control system for controllably maintaining a predetermined average power value of a power applied to a plasma of a sterilization system. The power has a frequency of from 0 to approximately 200 kHz. The power feedback control system includes a power monitor including a current monitor and a voltage monitor. The current monitor is adapted to produce a first signal indicative of a current applied to the plasma. The voltage monitor is adapted to produce a second signal indicative of a voltage applied to the plasma. The power monitor is adapted to produce a third signal in response to the first signal and second signal. The third signal is indicative of the power applied to the plasma. The power feedback control system further includes a power control module adapted to produce a fourth signal in response to the third signal from the power monitor and to a reference signal corresponding to the predetermined average power value.

Abstract: A method for sterilizing medical devices and similar instruments in diffusion-restricted containers is provided. The sterilization method includes placing a liquid solution containing vaporizable germicide such as hydrogen peroxide into the diffusion-restricted container and vaporizing the germicide. The containers can be attachable and detachable to a sterilization system, and used as a vacuum chamber. An attachable/detachable container containing an article to be sterilized can be nested with a second container, and the article and inside and outside of the inner container are sterilized. The sterile article inside the nested containers can be transported and the sterile inner container with the sterilized article can removed from the outer container and placed in a sterile environment without contaminating the sterile environment. The sterile article can then be removed from the sterile container and utilized.

Abstract: The present invention provides a sterilization system that includes a low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system to remove gas or vapor species from the article. The power has a frequency of from 0 to approximately 200 kHz. The low frequency power feedback control system includes a power monitor adapted to produce a first signal indicative of the power applied to the low frequency plasma within the vacuum chamber. The low frequency power feedback control system further includes a power control module adapted to produce a second signal in response to the first signal from the power monitor, and a power controller adapted to adjust, in response to the second signal, the power applied to the low frequency plasma to maintain a substantially stable average power applied to the low frequency plasma while the article is being processed.

Abstract: An apparatus for monitoring the concentration of an oxidative gas or vapor includes a first thermocouple junction and a chemical substance coupled to the first thermocouple junction. The chemical substance is reactive with the oxidative gas or vapor to produce heat. The apparatus further includes a second thermocouple junction coupled in series to the first thermocouple junction. A net voltage is generated across the first and second thermocouple junctions upon exposure of the chemical substance to the oxidative gas or vapor. The net voltage corresponds to the concentration of the oxidative gas or vapor.

Abstract: A method monitors a concentration of an oxidative gas or vapor in a diffusion-restricted region in fluid communication with a sterilization chamber during a sterilization process. The method includes providing a concentration monitor responsive to the oxidative gas or vapor by generating a parameter corresponding to the concentration of the oxidative gas or vapor. The concentration monitor includes a temperature sensing device coupled to a chemical substance reactive with the oxidative gas or vapor to produce heat. The method further includes placing at least a portion of the concentration monitor comprising the chemical substance within the diffusion-restricted region. The method further includes introducing the oxidative gas or vapor into the sterilization chamber. The method further includes monitoring the parameter generated by the concentration monitor during the sterilization process.

Abstract: A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.