Patents by Inventor Anthony Lin
Anthony Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12252531Abstract: Disclosed herein are monoclonal antibodies and antigen-binding fragments thereof capable of selectively inhibiting TGF?1 with high potency. Related compositions, methods and therapeutic use are also disclosed.Type: GrantFiled: July 11, 2019Date of Patent: March 18, 2025Assignee: Scholar Rock, Inc.Inventors: Abhishek Datta, Allan Capili, Thomas Schurpf, Constance Martin, Kevin B. Dagbay, Christopher Chapron, Stefan Wawersik, Christopher Littlefield, Gregory J. Carven, Alan Buckler, Susan Lin, Justin W. Jackson, Caitlin Stein, Andrew Avery, Anthony Cooper, Matthew Salotto
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Patent number: 12250941Abstract: A release device for a vaporizable and/or sublimateable pesticide is provided. The release device is suitable for use against subterranean pests (e.g. fire ants). The release device may be driven into and/or placed in a cavity within the soil or other substrate where the pests reside. The release device comprises a vapor injector which releases the pesticidal composition through apertures into the pest habitat, where it is distributed in vapor form.Type: GrantFiled: February 19, 2021Date of Patent: March 18, 2025Assignee: S. C. JOHNSON & SON, INC.Inventors: Nathan Woodbury, Robert James Etsu Takeuchi, Steven Lin, Anthony Hoover, Shannon Pyke
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Patent number: 12239463Abstract: An assembly and method for delivery of an analyte sensor including a reusable applicator having a proximal portion and a distal portion are disclosed. The reusable applicator can include a housing, a sensor carrier configured to releasably receive the first analyte sensor, a sharp carrier configured to releasably receive a sharp module, and an actuator movable relative to the housing.Type: GrantFiled: August 27, 2021Date of Patent: March 4, 2025Assignee: ABBOTT DIABETES CARE INC.Inventors: Vivek S. Rao, Anthony Lin Chern, Phillip W. Carter, Joshua Lindsay, Tuan Nguyen, Vincent M. DiPalma
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Patent number: 12233212Abstract: Some embodiments provide for an inspiratory limb for a breathing circuit that includes a first segment that comprises a first heater wire circuit and a second segment that comprises a second heater wire circuit. The inspiratory limb can include an intermediate connector that includes a connection circuit that electrically couples the first heater wire circuit to the second heater wire circuit. The inspiratory limb can be configured to operate in two modes wherein, in a first mode, electrical power passes through the first electrical connection to provide power to the first heater wire circuit without providing power to the second heater wire circuit, and in a second mode, electrical power pass through the first electrical connection to provide power to both the first heater wire circuit and the second heater wire circuit.Type: GrantFiled: February 18, 2021Date of Patent: February 25, 2025Assignee: Fisher & Paykel Healthcare LimitedInventors: Po-Yen Liu, Peter Alan Seekup, Anthony James Newland, Malcolm David Smith, Ping Si, Helgard Oosthuysen, Matthew Robert Wilson, Ian Lee Wai Kwan, Sinaa Alnashi, Paul James Tonkin, Kiel Anthony McCool, David Robert Kemps, Yayi Lin, Callum McDonald Ross, David John Sims
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Publication number: 20250058578Abstract: A greeting card assembly having an electronics unit embedded into the card. The electronics unit plays a length of music containing consecutive notes that can be selectively played over the speaker. A graphic of at least one instrument is displayed in the card. At least one activation sensor is provided within the graphic. Each activation sensor can be triggered by touching the graphic where the activation sensor is located. When an activation sensor is triggered, the electronics unit plays only one, two or three notes from the length of music. In this manner, to play the full length of music, the activation sensor must be repeatedly triggered. By strategically positioning each activation sensor in the graphic of the instrument, the repeated triggering of the activation sensor provides an appearance that a user is actually playing the instrument depicted in the graphic.Type: ApplicationFiled: October 17, 2024Publication date: February 20, 2025Inventors: Jen-Lin Chen, Anthony Carl T. Gonzales, Jay Kamhi
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Patent number: 12209152Abstract: The invention relates to novel linear, semi-crystalline, functional fluoropolymers that have been obtained by copolymerizing a fluorinated vinylic monomer and a hydrophilic monomer chosen from vinyl alkyl acids, vinyl phosphonates, functional acrylamides, carbonates, vinyl ethers, alkoxy compounds, and double hydrophilic group monomers.Type: GrantFiled: April 9, 2019Date of Patent: January 28, 2025Assignee: Arkema Inc.Inventors: James T. Goldbach, Anthony Bonnet, Caiping Lin, Wengsheng He, Katharine S. Pastore, James F. Coffey, Pa Nhia Xiong, Andrew Kahn
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Patent number: 12090663Abstract: Disclosed are a robot arm control method, a skin surface treatment apparatus, and a computer-readable memory medium, which relate to the field of mechanical control. the robot arm control method includes steps of: demarcating a to-be-treated surface of an object treated by a robot arm into at least two areas of interest; obtaining, by a three-dimensional scanning device, a three-dimensional point cloud corresponding to each area of interest; optimizing respective three-dimensional point clouds; merging the respective three-dimensional point clouds to obtain an executive point cloud; creating a motion path for the robot arm based on the executive point cloud; and performing, by the robot arm, a treatment to the surface of the object based on the motion path. Compared with conventional technologies, the disclosure has a better cost-effectiveness, an enhanced treatment efficiency, and an improved apparatus safety.Type: GrantFiled: July 23, 2021Date of Patent: September 17, 2024Assignee: Lin Chun Man AnthonyInventor: Chun Man Anthony Lin
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Publication number: 20230356394Abstract: Disclosed are a robot arm control method, a skin surface treatment apparatus, and a computer-readable memory medium, which relate to the field of mechanical control. the robot arm control method includes steps of: demarcating a to-be-treated surface of an object treated by a robot arm into at least two areas of interest; obtaining, by a three-dimensional scanning device, a three-dimensional point cloud corresponding to each area of interest; optimizing respective three-dimensional point clouds; merging the respective three-dimensional point clouds to obtain an executive point cloud; creating a motion path for the robot arm based on the executive point cloud; and performing, by the robot arm, a treatment to the surface of the object based on the motion path. Compared with conventional technologies, the disclosure has a better cost-effectiveness, an enhanced treatment efficiency, and an improved apparatus safety.Type: ApplicationFiled: July 23, 2021Publication date: November 9, 2023Inventor: Chun Man Anthony LIN
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Patent number: 11468045Abstract: Techniques of transaction support for a database are disclosed herein. One example technique includes generating a new version value for key-value pairs in the database and creating, in the database, a new key-value pair corresponding to a parameter to be updated with a new value using both the generated new version value and a name of the parameter as a key and the new value as the corresponding value for the created new key-value pair. The example technique can then include determining whether creating the new key-value pair is completed successfully in the database, and in response to determining that creating the new key-value pair corresponding to the parameter is not completed successfully, the existing value of the parameter is returned as a current value of the parameter instead of the new value in response to a query for the current value of the parameter.Type: GrantFiled: April 17, 2020Date of Patent: October 11, 2022Assignee: Microsoft Technology Licensing, LLCInventors: Yuva Priya Arunkumar, Anthony Lin, Deiva Shankar UthayaSankaralingam, Yingtao Dong
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Publication number: 20220167919Abstract: An assembly and method for delivery of an analyte sensor including a reusable applicator having a proximal portion and a distal portion are disclosed. The reusable applicator can include a housing, a sensor carrier configured to releasably receive the first analyte sensor, a sharp carrier configured to releasably receive a sharp module, and an actuator movable relative to the housing.Type: ApplicationFiled: August 27, 2021Publication date: June 2, 2022Inventors: Vivek S. Rao, Anthony Lin Chern, Phillip W. Carter, Joshua Lindsay, Tuan Nguyen, Vincent M. DiPalma
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Publication number: 20220125480Abstract: An assembly and method for delivery of an analyte sensor including a reusable applicator having a proximal portion and a distal portion are disclosed. The reusable applicator can include a housing, a sensor carrier configured a sensor carrier configured to releasably receive a first analyte sensor, a sharp carrier configured to releasably receive a sharp module and movable between the proximal portion of the reusable applicator and the distal portion of the reusable applicator for delivery of the first analyte sensor from the reusable applicator, and a reset tool configured to reset the reusable applicator for delivery of another analyte sensor.Type: ApplicationFiled: August 11, 2021Publication date: April 28, 2022Inventors: Vivek S. Rao, Anthony Lin Chern, Phillip W. Carter, Joshua Lindsay, Tuan Nguyen
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Publication number: 20210326330Abstract: Techniques of transaction support for a database are disclosed herein. One example technique includes generating a new version value for key-value pairs in the database and creating, in the database, a new key-value pair corresponding to a parameter to be updated with a new value using both the generated new version value and a name of the parameter as a key and the new value as the corresponding value for the created new key-value pair. The example technique can then include determining whether creating the new key-value pair is completed successfully in the database, and in response to determining that creating the new key-value pair corresponding to the parameter is not completed successfully, the existing value of the parameter is returned as a current value of the parameter instead of the new value in response to a query for the current value of the parameter.Type: ApplicationFiled: April 17, 2020Publication date: October 21, 2021Inventors: Yuva Priya Arunkumar, Anthony Lin, Deiva Shankar UthayaSankaralingam, Yingtao Dong
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Patent number: 11008654Abstract: A semiconductor fabrication apparatus includes a processing chamber; a wafer stage configured in the processing chamber; and a chemical delivery mechanism configured in the processing chamber to provide a chemical to a reaction zone in the processing chamber. The chemical delivery mechanism includes an edge chemical injector, a first radial chemical injector, and a second radial chemical injector configured on three sides of the reaction zone.Type: GrantFiled: November 27, 2019Date of Patent: May 18, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Publication number: 20200095682Abstract: A semiconductor fabrication apparatus includes a processing chamber; a wafer stage configured in the processing chamber; and a chemical delivery mechanism configured in the processing chamber to provide a chemical to a reaction zone in the processing chamber. The chemical delivery mechanism includes an edge chemical injector, a first radial chemical injector, and a second radial chemical injector configured on three sides of the reaction zone.Type: ApplicationFiled: November 27, 2019Publication date: March 26, 2020Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Patent number: 10494716Abstract: A semiconductor fabrication apparatus includes a processing chamber; a wafer stage configured in the processing chamber; a first chemical delivery mechanism configured in the processing chamber to provide a first chemical to a first reaction zone in the processing chamber; and air edge mechanisms configured on both sides of the first reaction zone to isolate the first reaction zone from other reaction zones in the processing chamber.Type: GrantFiled: December 17, 2018Date of Patent: December 3, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Publication number: 20190136378Abstract: A semiconductor fabrication apparatus includes a processing chamber; a wafer stage configured in the processing chamber; a first chemical delivery mechanism configured in the processing chamber to provide a first chemical to a first reaction zone in the processing chamber; and air edge mechanisms configured on both sides of the first reaction zone to isolate the first reaction zone from other reaction zones in the processing chamber.Type: ApplicationFiled: December 17, 2018Publication date: May 9, 2019Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Patent number: 10161039Abstract: A semiconductor fabrication apparatus includes a processing chamber, a wafer stage configured in the processing chamber, a first chemical delivery mechanism configured in the processing chamber to provide a first chemical to a first reaction zone in the processing chamber, and a second chemical delivery mechanism configured in the processing chamber to provide a second chemical to a second reaction zone in the processing chamber. The second chemical delivery mechanism includes an edge chemical injector and a first radial chemical injector both configured to deliver the second chemical to the second reaction zone.Type: GrantFiled: January 22, 2018Date of Patent: December 25, 2018Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Publication number: 20180142351Abstract: A semiconductor fabrication apparatus includes a processing chamber, a wafer stage configured in the processing chamber, a first chemical delivery mechanism configured in the processing chamber to provide a first chemical to a first reaction zone in the processing chamber, and a second chemical delivery mechanism configured in the processing chamber to provide a second chemical to a second reaction zone in the processing chamber. The second chemical delivery mechanism includes an edge chemical injector and a first radial chemical injector both configured to deliver the second chemical to the second reaction zone.Type: ApplicationFiled: January 22, 2018Publication date: May 24, 2018Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Patent number: 9873943Abstract: The present disclosure provides a semiconductor fabrication apparatus in accordance with one embodiment. The apparatus includes a processing chamber; a wafer stage configured in the processing chamber, the wafer stage is operable to secure and rotate a plurality of wafers around an axis; a first chemical delivery mechanism configured in the processing chamber to provide a first chemical to a first reaction zone in the processing chamber; and a second chemical delivery mechanism configured in the processing chamber to provide a second chemical to a second reaction zone in the processing chamber. The second chemical delivery mechanism includes an edge chemical injector and a first radial chemical injector.Type: GrantFiled: June 1, 2016Date of Patent: January 23, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee
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Publication number: 20170167021Abstract: The present disclosure provides a semiconductor fabrication apparatus in accordance with one embodiment. The apparatus includes a processing chamber; a wafer stage configured in the processing chamber, the wafer stage is operable to secure and rotate a plurality of wafers around an axis; a first chemical delivery mechanism configured in the processing chamber to provide a first chemical to a first reaction zone in the processing chamber; and a second chemical delivery mechanism configured in the processing chamber to provide a second chemical to a second reaction zone in the processing chamber. The second chemical delivery mechanism includes an edge chemical injector and a first radial chemical injector.Type: ApplicationFiled: June 1, 2016Publication date: June 15, 2017Inventors: Anthony Lin, Ching-Lun Lai, Pei-Ren Jeng, Tze-Liang Lee