Patents by Inventor Anthony Renau

Anthony Renau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and methods for wafer charge reduction for ion implantation
    Patent number: 4825087
    Abstract: A diode flood gun for introducing an amplified current of low energy electrons into an ion beam for neutralizing charge build up on a target such as a semiconductor wafer during irradiation by the beam. The low energy, amplified current is effected by introducing an inert gas into the flood gun.
    Type: Grant
    Filed: May 13, 1987
    Date of Patent: April 25, 1989
    Assignee: Applied Materials, Inc.
    Inventors: Anthony Renau, Stephen Moffatt, Frederick Plumb