Abstract: A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be placed around the walls of a plasma processing chamber. A liquid cooling coil may also be captured in the encapsulant between the electromagnetic coils. The structure may additionally include water fittings, locating pins, through tubes for chamber bolts, and lifting brackets.

Abstract: A method of fabricating a component for a substrate processing chamber involves providing a preform having internal and external surfaces, and providing a mandrel having a textured surface with a pattern of textured features comprising protrusions and depressions. The internal surface of the preform component is contacted with the textured surface of mandrel, and a pressure is applied to the external surface of the preform. The pressure is sufficiently high to plastically deform the preform over the textured surface of the mandrel to form a component having a textured internal surface comprising the pattern of textured feature that are shaped and sized to adhere process residues generated in the processing of substrates.

Abstract: A method and apparatus for providing a fluid channel on a surface that is subject to extreme temperatures is described. The embodiments described herein provide a fluid channel wherein the surface that is subject to the extreme temperatures forms one side of the fluid channel.

Abstract: The present invention embodies processing systems and vacuum chambers equipped to process substrates for flat panel displays, solar cells, or other electronic devices. The processing system and/or the vacuum chambers as well as their components and supporting structure are constructed of less costly materials and in a more energy efficient manner than that of current large area substrate processing systems. In one embodiment, the processing system chamber bodies and their supporting structures are constructed of reinforced concrete. In one embodiment, system processing chambers include a vacuum tight lining disposed inside reinforced concrete chamber bodies.

Abstract: A magnet encapsulated within a canister formed from two cans into a laminated structure particularly useful in plasma processing reactors. Each can includes an end wall and a cylindrical sidewall. One can additionally includes an annular lip that slidably fits outside the sidewall of the other can with a small gap therebetween. The magnet is inserted into the two cans together with a flowable and curable adhesive such as epoxy. The cans are slid together and compressed to cause the adhesive to flow between the magnet and the two cans and between the lip of one can and the sidewall of the other. The adhesive is cured to bond the magnet to the cans and to bond the cans together and to also hermetically seal the structure. The cans may be deep drawn from non-magnetic stainless steel with wall thicknesses of less than 0.064 mm.

Abstract: A electromagnet array structure including multiple electromagnetic coils captured in a rigid encapsulant, for example, of cured epoxy resin, to form a unitary free-standing structure which can be placed around the walls of a plasma processing chamber. A liquid cooling coil may also be captured in the encapsulant between the electromagnetic coils. The structure may additionally include water fittings, locating pins, through tubes for chamber bolts, and lifting brackets.

Abstract: A method of refurbishing a wall of a plasma process chamber which has a surface with a magnet assembly fitted thereon. The magnet assembly has an expandable hollow collar with a plurality of magnets inside. In the method, the diameter of the hollow collar of the magnet assembly is expanded to remove the hollow collar from the wall. The surface of the wall is cleaned. The hollow collar of the original magnet assembly, or of another magnet assembly, is then snap fitted back onto the surface of the wall.

Abstract: A method of fabricating a sputtering target for sputter depositing material onto a substrate in a sputtering chamber is described. In one embodiment of the method, a preform having a surface is formed and a layer of sputtering material is electroplated onto the surface of the preform to form the target. The method can be applied to form a sputtering target having a non-planar surface.

Abstract: A magnet assembly for a plasma process chamber has a hollow collar comprising a cross-section that is absent seams. The hollow collar has an open end face and a cap is provided to seal the open end face of the collar. A plurality of magnets are in the hollow collar, the magnets being insertable through the open end face. The collar is capable of being snap fitted onto the chamber wall. The magnet assembly can also comprise one or more of the collars such that the collars, when installed, form a substantially continuous ring about a chamber wall.

Abstract: A sputtering target comprising an inverted annular trough encircling a central cylindrical well, and additionally comprising a plurality of electroplated layers of sputtering material is described. The sputtering material comprises at least one of aluminum, copper, tantalum, titanium and tungsten.

Abstract: A method of fabricating a component for a substrate processing chamber involves providing a preform having internal and external surfaces, and providing a mandrel having a textured surface with a pattern of textured features comprising protrusions and depressions. The internal surface of the preform component is contacted with the textured surface of mandrel, and a pressure is applied to the external surface of the preform. The pressure is sufficiently high to plastically deform the preform over the textured surface of the mandrel to form a component having a textured internal surface comprising the pattern of textured feature that are shaped and sized to adhere process residues generated in the processing of substrates.

Abstract: A magnet assembly for a plasma process chamber has a hollow collar comprising a cross-section that is absent seams. The hollow collar has an open end face and a cap is provided to seal the open end face of the collar. A plurality of magnets are in the hollow collar, the magnets being insertable through the open end face. The collar is capable of being snap fitted onto the chamber wall. The magnet assembly can also comprise one or more of the collars such that the collars, when installed, form a substantially continuous ring about a chamber wall.

Abstract: A magnet encapsulated within a canister formed from two cans into a laminated structure particularly useful in plasma processing reactors. Each can includes an end wall and a cylindrical sidewall. One can additionally includes an annular lip that slidably fits outside the sidewall of the other can with a small gap therebetween. The magnet is inserted into the two cans togther with a flowable and curable adhesive such as epoxy. The cans are slid together and compressed to cause the adhesive to flow between the magnet and the two cans and between the lip of one can and the sidewall of the other. The adhesive is cured to bond the magnet to the cans and to bond the cans together and to also hermetically seal the structure. The cans may be deep drawn from non-magnetic stainless steel with wall thicknesses of less than 0.064 mm.

Abstract: A method of fabricating a sputtering target for sputter depositing material onto a substrate in a sputtering chamber is described. In one embodiment of the method, a preform having a surface is formed and a layer of sputtering material is electroplated onto the surface of the preform to form the target. The method can be applied to form a sputtering target having a non-planar surface.

Abstract: A suspension system comprises an actuator arm and two suspensions. Each suspension has a load beam and a laminated member comprised of a support layer, an electrically insulating layer, and an electrically conducting layer. The laminated members are etched to form electrical lines for each suspension. The laminate member of each suspension is bent along the side of the arm such that they overlap one another in order to reduce the required space.

Abstract: A limit stop for magnetic storage disk drive systems comprising a spring portion and a mount portion. The spring portion is a single piece molded structure that is preloaded against a precision machined surface on the mount portion during assembly. The preloaded spring feature provides good energy absorption characteristics to reduce the limit stop deflection during actuator contact. The precision machined surface on the mount portion accurately determines the limit stop position, thereby reducing tolerance requirements on the spring portion.

Abstract: A high pressure fluid source is connected to a primary orifice and a valved orifice of a binarily activated pressure regulator. The primary orifice alone supplies the fluid at a pressure below the minimum desired, and both orifices together supply the fluid at a pressure greater than the maximum desired. A sensor at the output is adjusted to open the binary valve when the minimum pressure is reached, and close the valve when the maximum pressure is reached, thus cycling between the two conditions.

Abstract: Ink supply system and sequencing for purge, startup, operation, and shutoff of pressurized ink jet systems. Employing an ink jet head having an inlet, startup is accomplished by filling the head with ink, closing an inlet valve, building pressure behind the valve to a level significantly greater than required for operation, and opening the valve. The system includes an inlet valve connecting a pump from a reservoir to the ink jet head, and an outlet valve connecting an outlet from the head to the reservoir and a vacuum source. At shutoff, the inlet valve is closed with the outlet valve open to create a negative pressure in the head.