Patents by Inventor ANTOINE COLAS

ANTOINE COLAS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11549182
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)2(OR)2??Formula I, M(=O)(NR2)4??Formula II, M(=O)2(NR2)2??Formula III, M(=NR)2(OR)2??Formula IV, and M(=O)(OR)4??Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Grant
    Filed: September 30, 2021
    Date of Patent: January 10, 2023
    Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
    Inventors: Clément Lansalot-Matras, Julien Lieffrig, Christian Dussarrat, Antoine Colas, Jong Min Kim
  • Publication number: 20220024825
    Abstract: Disclosed is use of a compound of formula (I) to determine the quantity of clay in a sand and/or to determine the amount of CMA compound to be added to a hydraulic binder composition using a sand: R1—(OA)n-XR2??(I) where: R1 is a linear or branched C1 to C4 alkyl groups, or a coloured compound; R2 is a coloured compound; A, each the same or different, are independently a —CH2—CH2— group or —CH(CH3)—CH2— group; n is an integer of between 1 and 500, preferably between 4 and 250; and X is O or NH.
    Type: Application
    Filed: November 25, 2019
    Publication date: January 27, 2022
    Inventors: Christophe DERLY, Antoine COLAS
  • Publication number: 20220018026
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)2(OR)2??Formula I, M(=O)(NR2)4??Formula II, M(=O)2(NR2)2??Formula III, M(=NR)2(OR)2??Formula IV, and M(=O)(OR)4??Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Application
    Filed: September 30, 2021
    Publication date: January 20, 2022
    Inventors: Clément LANSALOT-MATRAS, Julien LIEFFRIG, Christian DUSSARRAT, Antoine COLAS, Jong Min KIM
  • Patent number: 11162175
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)2(OR)2??Formula I, M(=O)(NR2)4??Formula II, M(=O)2(NR2)2??Formula III, M(=NR)2(OR)2??Formula IV, and M(=O)(OR)4??Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: November 2, 2021
    Assignee: L'Air Liquide SociétéAnonyme pour I'Etude et I'Exploitation des Procédés Georges Claude
    Inventors: Clément Lansalot-Matras, Julien Lieffrig, Christian Dussarrat, Antoine Colas, Jong Min Kim
  • Patent number: 11064834
    Abstract: The invention relates to a food pressure cooking appliance including a bowl and a lid intended to be locked relative to the bowl to form with the latter a cooking chamber adapted to rise in pressure. The appliance includes bayonet locking means forming first and second series of protrusions that are integral with the envelope of the lid and the envelope of the bowl, respectively, and that are intended to cooperate with each other to ensure the locking of the lid relative to the bowl. Each protrusion of at least one of the series consists of a volume element that has opposite convex and concave faces and is formed by a localized radial deformation of the corresponding envelope.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: July 20, 2021
    Assignee: SEB S.A.
    Inventors: Thomas Antoine Colas, Eric Chameroy, Hubert Chaillard
  • Patent number: 10731251
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(?O)2(OR)2??Formula I, M(?O)(NR2)4??Formula II, M(?O)2(NR2)2??Formula III, M(?NR)2(OR)2??Formula IV, and M(?O)(OR)4??Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: August 4, 2020
    Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
    Inventors: Clément Lansalot-Matras, Julien Lieffrig, Christian Dussarrat, Antoine Colas, Jong Min Kim
  • Publication number: 20200199749
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)2(OR)2 ??Formula I, M(=O)(NR2)4 ??Formula II, M(=O)2(NR2)2 ??Formula III, M(=NR)2(OR)2 ??Formula IV, and M(=O)(OR)4 ??Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Inventors: Clément LANSALOT-MATRAS, Julien LIEFFRIG, Christian DUSSARRAT, Antoine COLAS, Jong Min KIM
  • Publication number: 20180355484
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(?O)2(OR)2 ??Formula I, M(?O)(NR2)4 ??Formula II, M(?O)2(NR2)2 ??Formula III, M(?NR)2(OR)2 ??Formula IV, and M(?O)(OR)4 ??Formula V, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Application
    Filed: August 21, 2018
    Publication date: December 13, 2018
    Inventors: Clément LANSALOT-MATRAS, Julien Lieffrig, Christian Dussarrat, Antoine Colas, Jong Min Kim
  • Patent number: 10094021
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(=O)(NR2)4 Formula I, M(=O)2(NR2)2 Formula II, and M(=NR)2(OR)2 Formula III, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: October 9, 2018
    Assignee: L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des Procedes Georges Claude
    Inventors: Clément Lansalot-Matras, Julien Lieffrig, Christian Dussarrat, Antoine Colas, Jong Min Kim
  • Publication number: 20170268107
    Abstract: Disclosed are Group 6 film forming compositions comprising Group 6 transition metal-containing precursors selected from the group consisting of: M(?O)(NR2)4 Formula I, M(?O)2(NR2)2 Formula II, and M(?NR)2(OR)2 Formula III, wherein M is Mo or W and each R is independently H, a C1 to C6 alkyl group, or SiR?3, wherein R? is H or a C1 to C6 alkyl group. Also disclosed are methods of synthesizing and using the disclosed compositions to deposit Group 6 transition metal-containing films on substrates via vapor deposition processes.
    Type: Application
    Filed: August 11, 2015
    Publication date: September 21, 2017
    Inventors: Clement LANSALOT-MATRAS, Julien LIEFFRIG, Christian DUSSARRAT, Antoine COLAS, Jong Min KIM
  • Publication number: 20170204126
    Abstract: Electrochromic tungsten or molybdenum oxide and their doped derivative nanomaterials are prepared using sol-gel or vapor deposition methods from precursors containing only tungsten, oxygen, carbon and hydrogen, as other elements can generate optical defects impacting the electrochromic performances. Preferably, the liquid and volatile compound W(?O)(OsBu)4 is the precursor used.
    Type: Application
    Filed: July 7, 2015
    Publication date: July 20, 2017
    Inventors: Christian DUSSARRAT, Antoine COLAS, Jong Min KIM
  • Publication number: 20170172335
    Abstract: The invention relates to a food pressure cooking appliance including a bowl and a lid intended to be locked relative to the bowl to form with the latter a cooking chamber adapted to rise in pressure. The appliance also including bayonet locking means forming first and second series of protrusions that are integral with the envelope of the lid and the envelope of the bowl, respectively, and that are intended to cooperate with each other to ensure the locking of the lid relative to the bowl. Each protrusion of at least one of said series is consisted by a volume element that has opposite convex and concave faces, and that is formed by a localized radial deformation of the corresponding envelope.
    Type: Application
    Filed: March 26, 2015
    Publication date: June 22, 2017
    Inventors: THOMAS ANTOINE COLAS, Eric CHAMEROY, Hubert CHAILLARD
  • Publication number: 20160315168
    Abstract: Precursors suitable for vapor deposition of layers in thin film transistors and electronic devices comprising such thin film transistors are disclosed.
    Type: Application
    Filed: June 30, 2016
    Publication date: October 27, 2016
    Inventors: Christian DUSSARRAT, Clément LANSALOT-MATRAS, Antoine COLAS
  • Publication number: 20160315163
    Abstract: Precursors suitable for vapor deposition of layers in thin film transistors and electronic devices comprising such thin film transistors are disclosed.
    Type: Application
    Filed: June 30, 2016
    Publication date: October 27, 2016
    Inventors: CHRISTIAN DUSSARRAT, CLÉMENT LANSALOT-MATRAS, ANTOINE COLAS