Abstract: Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.

Abstract: Column for simultaneously producing a focused particle beam and a focused light beam and method for treating a sample using the column. The column has lateral walls, an input electrode having a particle aperture for emitting a particle beam, an electrostatic lens, an optical focusing device within the lens, and a deflection optical mirror. The method comprises locating the sample below the column, passing the particle beam through entry aperture and exit aperture of the lens to be focused on a selected location on the sample, and injecting an optical beam into the lens through the entry aperture. The lens incorporates convex and concave optical mirrors. The optical beam is injected into the lens to reflect from the convex optical mirror towards the concave optical mirror and then reflect from the concave optical mirror to exit from the exit aperture to be focused on the selected location on the sample.

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Abstract: The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterised in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said out-put orifice.

Abstract: A scanning electron microscope has means for generating a beam of electrons which is scanned over a specimen held within a holder in a chamber which contains a gaseous medium. A negative potential is applied to the holder so as to generate an electric field which accelerates secondary electrons, formed by the interaction or the primary beam with the specimen, in a direction away from the specimen surface and into a collision zone in the chamber. In that zone, the accelerated secondary electrons collide with gas molecules of the gaseous medium, thereby initiating a cascade of collisions which, in effect, amplifies the secondary electron signal. That signal (which may take the form of photons generated as a result of the collisions) is detected by detecting means, such as a photo-multiplier.

Abstract: A novel high brightness point ion source (10) that is adapted to operate with liquid ionic compounds such as mixtures of molten salts, bases or acids. The ion source is basically comprised of two parts: the needle assembly (11) and the extraction assembly (12). The former consists of a point shaped needle (13) made of a refractory ceramic material, whose sharpened extremity is referred to as the tip (13a). The needle is partially lodged in a recess of an insulating support (15). A heating coil (14) made of stainless steel is tightly wound around a portion of the needle adjacent to the tip. The needle is coated with the mixture, for instance, by dipping in a crucible containing the mixture. The extraction assembly is comprised of a metal extracting electrode (20) provided with a central aperture that is screwed on a cylindrical metallic body (19), so that the spacing between the tip and the aperture center is adjustable.

Abstract: A heated apparatus, positioned in the X, Y, and Z directions, for forming fine lines of molten material on a substrate. The apparatus includes a pen having a refractory tip wetted with material in a molten state. The tip is attached to a V-shaped heater to form a heater assembly. The ends of the V-shaped heater are welded to the pins of a three lead TO-5 package base. The pen is then mounted on an apparatus adapted to direct writing. To that end, the pen is attached to a supporting device capable of moving in the X, Y, and Z directions. When the welding point of the tip/heater assembly reaches the melting point of the material to be deposited, it is dipped in a crucible containing the material in a molten state. The welding point nucleates a minute drop of the molten material, forming a reservoir. A thin film of material flows from the reservoir and wets the tip, which is then brought in contact with the substrate upon which the desired pattern is to be formed.

Abstract: A method for forming a desired pattern of a material of conductive or non-conductive type on a variety of substrates. It is based on the use of a pen which essentially consists of a refractory tip wetted with the material in the molten state. The pen preferably consists of a pointed tungsten tip attached to the top of a V-shaped tungsten heater, forming a heater assembly. The tip and the heater top portion are roughened at the vicinity of the welding point. In turn, the ends of the V-shaped heater are welded to the pins of a 3-lead TO-5 package base. The pen is incorporated in an apparatus adapted to the direct writing technique. To that end, the pen is attached to a supporting device capable of movements in the X, Y and Z directions, while the substrate is placed on an X-Y stage for adequate X, Y and Z relative movements therebetween. The two pins of the pen are connected to a power supply to resistively heat the heater.