Patents by Inventor Antoine Gaston Marie Kiers
Antoine Gaston Marie Kiers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11966168Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern. The set of images are registered relative to each other to superimpose the instances of the pattern. Variation in the pattern is measured using the registered set of images. The pattern comprises a plurality of pattern elements and the registration comprises applying different weightings to two or more of the plurality of pattern elements. The weightings control the extent to which each pattern element contributes to the registration of the set of images. Each weighting is based on an expected variation of the pattern element to which the weighting is applied.Type: GrantFiled: September 24, 2021Date of Patent: April 23, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Antoine Gaston Marie Kiers, Scott Anderson Middlebrooks, Jan-Willem Gemmink
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Patent number: 11847570Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data comprising an input image of at least a part of a substrate having a plurality of features and a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation of the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.Type: GrantFiled: June 10, 2022Date of Patent: December 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Adrianus Cornelis Matheus Koopman, Scott Anderson Middlebrooks, Antoine Gaston Marie Kiers, Mark John Maslow
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Publication number: 20230298850Abstract: Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.Type: ApplicationFiled: May 18, 2023Publication date: September 21, 2023Applicant: ASML Netherlands B.V.Inventors: Marijke SCOTUZZI, Roy Ramon VEENSTRA, Antoine Gaston Marie KIERS
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Patent number: 11525786Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: March 4, 2021Date of Patent: December 13, 2022Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cédric Désiré Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Publication number: 20220327686Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data comprising an input image of at least a part of a substrate having a plurality of features and a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation of the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.Type: ApplicationFiled: June 10, 2022Publication date: October 13, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Adrianus Cornelis Matheus KOOPMAN, Scott Anderson Middlebrooks, Antoine Gaston Marie Kiers, Mark John Maslow
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Patent number: 11379970Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data including an input image of at least a part of a substrate having a plurality of features and including a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation with the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.Type: GrantFiled: February 15, 2019Date of Patent: July 5, 2022Assignee: ASML Netherlands B.V.Inventors: Adrianus Cornelis Matheus Koopman, Scott Anderson Middlebrooks, Antoine Gaston Marie Kiers, Mark John Maslow
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Publication number: 20220011680Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern. The set of images are registered relative to each other to superimpose the instances of the pattern. Variation in the pattern is measured using the registered set of images. The pattern comprises a plurality of pattern elements and the registration comprises applying different weightings to two or more of the plurality of pattern elements. The weightings control the extent to which each pattern element contributes to the registration of the set of images. Each weighting is based on an expected variation of the pattern element to which the weighting is applied.Type: ApplicationFiled: September 24, 2021Publication date: January 13, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Antoine Gaston Marie KIERS, Scott Anderson Middlebrooks, Jan-Willem Gemmink
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Publication number: 20210407112Abstract: A method for determining an image-metric of features on a substrate, the method including: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the one or more aligned versions of the one or more further images.Type: ApplicationFiled: September 23, 2019Publication date: December 30, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo TEL, Antoine Gaston Marie KIERS, Vadim Yourievich TIMOSHKOV, Hermanus Adrianus DILLEN, Yichen ZHANG, Te-Sheng WANG, Tzu-Chao CHEN
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Publication number: 20210374936Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data including an input image of at least a part of a substrate having a plurality of features and including a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation with the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.Type: ApplicationFiled: February 15, 2019Publication date: December 2, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Adrianus Cornelis Matheus KOOPMAN, Scott Anderson MIDDLEBROOKS, Antoine Gaston Marie KIERS, Mark John MASLOW
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Patent number: 11131936Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.Type: GrantFiled: February 7, 2018Date of Patent: September 28, 2021Assignee: ASML Netherlands B.V.Inventors: Antoine Gaston Marie Kiers, Scott Anderson Middlebrooks, Jan-Willem Gemmink
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Publication number: 20210208083Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: ApplicationFiled: March 4, 2021Publication date: July 8, 2021Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Amo Jan BLEEKER, Youri Johannes VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cédric Désiré GROUWSTRA, Markus Geradus Maritinus VAN KRAAIJ
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Patent number: 10955353Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: February 7, 2019Date of Patent: March 23, 2021Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Maria Van Kraaij
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Publication number: 20190391500Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.Type: ApplicationFiled: February 7, 2018Publication date: December 26, 2019Inventors: Antoine Gaston Marie KIERS, Scott Anderson MIDDLEBROOKS, Jan-Willem GEMMINK
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Publication number: 20190170657Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: ApplicationFiled: February 7, 2019Publication date: June 6, 2019Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria DEN BOEF, Arno Jan BLEEKER, Youri Johannes Laurentiu VAN DOMMELEN, Mircea DUSA, Antoine Gaston Marie KIERS, Paul Frank LUEHRMANN, Henricus Petrus Maria PELLEMANS, Maurits VAN DER SCHAAR, Cedric Desire GROUWSTRA, Markus Gerardus Martinus VAN KRAAIJ
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Patent number: 10241055Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.Type: GrantFiled: April 29, 2014Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij
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Patent number: 9454084Abstract: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model error between measured and modeled position, measuring a corresponding overlay error between first and second pattern and comparing the model error with the overlay error to determine the usefulness of the alignment mark. Subsequently this information can be used when processing next substrates thereby improving the overlay for these substrates. A lithographic apparatus and/or overlay measurement system may be operated in accordance with the method.Type: GrantFiled: April 23, 2013Date of Patent: September 27, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis
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Patent number: 9360769Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.Type: GrantFiled: August 10, 2012Date of Patent: June 7, 2016Assignee: ASML Netherlands B.V.Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
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Patent number: 9360770Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.Type: GrantFiled: December 5, 2014Date of Patent: June 7, 2016Assignee: ASML Netherlands B.V.Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
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Patent number: 9128065Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.Type: GrantFiled: April 1, 2014Date of Patent: September 8, 2015Assignee: ASML Netherlands B.V.Inventors: Hugo Augustinus Joseph Cramer, Antoine Gaston Marie Kiers, Henricus Petrus Maria Pellemans
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Publication number: 20150146188Abstract: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model error between measured and modeled position, measuring a corresponding overlay error between first and second pattern and comparing the model error with the overlay error to determine the usefulness of the alignment mark. Subsequently this information can be used when processing next substrates thereby improving the overlay for these substrates. A lithographic apparatus and/or overlay measurement system may be operated in accordance with the method.Type: ApplicationFiled: April 23, 2013Publication date: May 28, 2015Inventors: Irina Lyulina, Franciscus Godefridus Casper Bijnen, Remi Daniel Marie Edart, Antoine Gaston Marie Kiers, Michael Kubis