Patents by Inventor Antoine Hervier

Antoine Hervier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11621387
    Abstract: Circuits and methods of operation that can facilitate reducing surface losses for quantum devices are provided. In one example, a quantum device can comprise a dielectric layer, a first electrode, and a second electrode. The dielectric layer can comprise a recess formed in a surface of the dielectric layer that reduces a thickness of the dielectric layer from a first thickness external to a footprint of the recess to a second thickness within the footprint of the recess. The second thickness can be less than the first thickness. The first electrode can be positioned within the footprint of the recess. The second electrode can be electrically isolated from the first electrode by the dielectric layer. The first and second electrodes can be positioned on opposing surfaces of the dielectric layer.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: April 4, 2023
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Yves Martin, Jason S. Orcutt, Antoine Hervier, Martin O. Sandberg, Harry Jonathon Mamin
  • Publication number: 20220293844
    Abstract: Circuits and methods of operation that can facilitate reducing surface losses for quantum devices are provided. In one example, a quantum device can comprise a dielectric layer, a first electrode, and a second electrode. The dielectric layer can comprise a recess formed in a surface of the dielectric layer that reduces a thickness of the dielectric layer from a first thickness external to a footprint of the recess to a second thickness within the footprint of the recess. The second thickness can be less than the first thickness. The first electrode can be positioned within the footprint of the recess. The second electrode can be electrically isolated from the first electrode by the dielectric layer. The first and second electrodes can be positioned on opposing surfaces of the dielectric layer.
    Type: Application
    Filed: March 11, 2021
    Publication date: September 15, 2022
    Inventors: Yves Martin, Jason S. Orcutt, Antoine Hervier, Martin O. Sandberg, Harry Jonathon Mamin
  • Patent number: 9312342
    Abstract: A new composition of matter is disclosed wherein oxygen vacancies in a semiconducting transition metal oxide such as titanium dioxide are filled with a halogen such as Fluorine, whereby the conductivity of the composition is greatly enhanced, while at the same time the chemical stability of the composition is greatly improved. Stoichiometric titanium dioxide having less than 3 % oxygen vacancies is subject to fluorine insertion such that oxygen vacancies are filled, limited amounts of fluorine replace additional oxygen atoms and fluorine interstitially inserts into the body of the TiO2 composition.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: April 12, 2016
    Assignee: The Regents of the University of California
    Inventors: L. Robert Baker, Hyungtak Seo, Antoine Hervier, Gabor A. Somorjai
  • Publication number: 20140306215
    Abstract: A new composition of matter is disclosed wherein oxygen vacancies in a semiconducting transition metal oxide such as titanium dioxide are filled with a halogen such as Fluorine, whereby the conductivity of the composition is greatly enhanced, while at the same time the chemical stability of the composition is greatly improved. Stoichiometric titanium dioxide having less than 3% oxygen vacancies is subject to fluorine insertion such that oxygen vacancies are filled, limited amounts of fluorine replace additional oxygen atoms and fluorine interstitially inserts into the body of the TiO2 composition.
    Type: Application
    Filed: December 16, 2011
    Publication date: October 16, 2014
    Applicant: The Regents of the Unviersity of California
    Inventors: L. Robert Baker, Hyungtak Seo, Antoine Hervier, Gabor A. Somorjai