Patents by Inventor Antoine Marie Kiers

Antoine Marie Kiers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Focus determination method, device manufacturing method, and mask
    Publication number: 20070003840
    Abstract: One or more focus settings for use in a device manufacturing method is determined by printing a plurality of target markers at different focus settings and using a scatterometer, e.g. off-line, to measure a property of the target markers that is indicative of focus.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Maurits Van Der Schaar, Arie Den Boef, Mircea Dusa, Antoine Marie Kiers
  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Publication number: 20060033921
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.
    Type: Application
    Filed: August 16, 2004
    Publication date: February 16, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Den Boef, Mircea Dusa, Antoine Marie Kiers, Maurits Der Schaar