Abstract: Methods, systems, and devices for data processing are described. Some database systems may implement data processing permits to manage data access. A database system may use encryption schemes to tie permits to data (e.g., cryptographically ensuring that the system follows data regulations). To support queries for a database implementing such encryption schemes, the database may implement a proxy. When the system receives a query, the database proxy may intercept and transform the query based on the encryption schema of the database. The database proxy may execute the transformed query at the database, receive encrypted query results in response, and decrypt the results for use by the querying application. Additionally, the system may access relevant data processing permits to support querying operations. For example, the system may use permits when transforming the query, executing the query in the database, preparing query results for the querying application, or any combination thereof.

Abstract: A method of forming a pattern, the method comprising: providing a photoresist underlayer over a substrate; forming a photoresist layer over the photoresist underlayer; patterning the photoresist layer; and transferring a pattern from the patterned photoresist layer to the photoresist underlayer; wherein the photoresist underlayer is formed from a composition comprising a solvent and a compound represented by Formula 1 or a polymer having a repeating unit represented by Formula 2 wherein in Formulae 1 and 2: Ar1 and Ar2 independently represent an aromatic group; and Y1, Y2, X1, X2, X3, T1, T2, Z1, and Z2 are as defined.

Abstract: A method of forming a pattern, the method comprising: applying a photoresist underlayer composition over a substrate to provide a photoresist underlayer; forming a photoresist layer over the photoresist underlayer; patterning the photoresist layer; and transferring a pattern from the patterned photoresist layer to the photoresist underlayer. The photoresist underlayer composition includes a polymer that includes a repeating unit represented by Formula 1 as described herein, a compound including a substituent group represented by Formula 2 as described herein, and a solvent.

Abstract: A photoresist underlayer composition, comprising a first material comprising two or more hydroxy groups; a second material comprising two or more glycidyl groups; an additive, wherein the additive comprises a compound of Formula (5), a compound of Formula (6), or a combination thereof; and a solvent, wherein the structures of Formula (5) and (6) are as disclosed herein.

Abstract: A method of forming a pattern, the method comprising applying a layer of a coating composition over a substrate; curing the applied coating composition to form a coated underlayer; and forming a photoresist layer over the coated underlayer, wherein the coating composition comprises a first material comprising two or more hydroxy groups; a second material comprising two or more glycidyl groups; an additive comprising a protected amino group; and a solvent.