Patents by Inventor Anton KORIAKIN
Anton KORIAKIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11977332Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.Type: GrantFiled: September 11, 2020Date of Patent: May 7, 2024Assignees: SEMES CO., LTD., Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Hae-Won Choi, Yerim Yeon, Anton Koriakin, Kihoon Choi, Youngran Ko, Jeong Ho Cho, Hyungseok Kang, Hong Gi Min
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Patent number: 11940734Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.Type: GrantFiled: April 21, 2022Date of Patent: March 26, 2024Assignee: SEMES CO., LTD.Inventors: Ki Hoon Choi, Eung Su Kim, Pil Kyun Heo, Jin Yeong Sung, Hae-Won Choi, Anton Koriakin, Joon Ho Won
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Patent number: 11887866Abstract: A supercritical processing apparatus includes an upper vessel including a first fluid hole formed in a center thereof, and a lower vessel including a second fluid hole formed in a center thereof. A space is defined between the upper and lower vessels and configured to allow a substrate to be placed therein. The upper vessel further includes a first guide portion provided at a lower portion thereof to be gradually inclined downward toward a periphery thereof from the first fluid hole.Type: GrantFiled: October 18, 2019Date of Patent: January 30, 2024Assignee: SEMES CO., LTD.Inventors: Jae Seong Lee, Hae Won Choi, Ki Hoon Choi, Anton Koriakin, Chan Young Heo, Do Heon Kim, Ji Soo Jeon
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Publication number: 20230369081Abstract: Provided is an apparatus for processing a substrate, the apparatus including: a processing chamber configured to provide a processing space; a fluid supply device configured to supply a supercritical fluid to the processing chamber; a fluid discharge device configured to discharge the supercritical fluid from the processing chamber; and a control device configured to control operations of the fluid supply device and the fluid discharge device, wherein the fluid supply device includes a first supply line connected to an upper portion of the processing chamber and a second supply line connected to a lower portion of the processing chamber, and the control device is configured to perform a plurality of first cycles in which the supercritical fluid is alternately supplied into the processing space through the first supply line and the second supply line to boost pressure in the processing space to a set pressure.Type: ApplicationFiled: May 15, 2023Publication date: November 16, 2023Inventors: Haewon Choi, Anton Koriakin, Joonho Won, Hyungseok Kang, Minwoo Kim
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Publication number: 20230341779Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.Type: ApplicationFiled: April 21, 2022Publication date: October 26, 2023Inventors: Ki Hoon Choi, Eung Su Kim, Pil Kyun Heo, Jin Yeong Sung, Hae-Won Choi, Anton Koriakin, Joon Ho Won
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Publication number: 20220415643Abstract: In a substrate processing method, a rinse process using a rinse solution is performed on a development-processed photoresist pattern on a substrate. A substitution process including a first substitution step using a mixed solution of a non-polar organic solvent and a surfactant and a second substitution step using the non-polar organic solvent is performed on the substrate. The substitution process is performed a plurality of times until the rinse solution remaining on the substrate is less than a predetermined value. A supercritical fluid drying process is performed on the substrate to dry the non-polar organic solvent remaining on the substrate.Type: ApplicationFiled: April 25, 2022Publication date: December 29, 2022Applicants: Semes Co., Ltd., Samsung Electronics Co., Ltd.Inventors: Hae-Won CHOI, Anton KORIAKIN, Sangjine Park PARK, Keonyoung KIM, Sukhoon KIM, Seohyun KIM, Young-Hoo KIM, Kuntack LEE, Jihoon JEONG
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Patent number: 11530375Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.Type: GrantFiled: October 11, 2019Date of Patent: December 20, 2022Assignee: SEMES CO., LTD.Inventors: Hae-Won Choi, Kihoon Choi, Jaeseong Lee, Chan Young Heo, Anton Koriakin, Do Heon Kim, Ji Soo Jeong
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Publication number: 20220290921Abstract: The inventive concept provides a method for treating a substrate. The method for treating a substrate comprises: a pressurization step for increasing a pressure of an inner space of a chamber by supplying a treating fluid to the inner space, after taking the substrate into the inner space; a flow step for generating a flow of the treating fluid by combination of supplying and discharging the treating fluid to and from the inner space; and a depressurization step of decreasing the pressure of the inner space by discharging the treating fluid from the inner space, and wherein the pressurization step comprises: a bottom side supply process for increasing the pressure of the inner space by supplying the treating fluid to a backside of the substrate taken into the inner space; and a top side supply process of increasing the pressure of the inner space by supplying the treating fluid to a top side of the substrate taken into the inner space.Type: ApplicationFiled: March 11, 2022Publication date: September 15, 2022Applicant: SEMES CO., LTD.Inventors: Hae-Won CHOI, Anton KORIAKIN, Joon Ho WON, Min Woo KIM, Ki Hoon CHOI, Eung Su KIM, Tae Hee KIM, Pil Kyun HEO, Jang Jin LEE, Jin Yeong SUNG
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Patent number: 11410862Abstract: An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.Type: GrantFiled: April 28, 2019Date of Patent: August 9, 2022Assignee: SEMES CO., LTD.Inventors: Jaeseong Lee, Kihoon Choi, Hae-Won Choi, Anton Koriakin, Chan Young Heo, Do Heon Kim, Ji Soo Jeong
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Publication number: 20210166939Abstract: Embodiments of the inventive concept provide a substrate treating apparatus. According to an exemplary embodiment, the substrate treating apparatus comprises a first process chamber applying a process fluid containing an organic solvent to a substrate wet with a developer and introduced; and a second process chamber treating the substrate applied with the process fluid and introduced, through a supercritical fluid.Type: ApplicationFiled: November 20, 2020Publication date: June 3, 2021Inventors: Hae-Won CHOI, Anton KORIAKIN
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Patent number: 11004675Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.Type: GrantFiled: September 12, 2018Date of Patent: May 11, 2021Assignee: SEMES CO., LTD.Inventors: Hae-Won Choi, Ki-Moon Kang, Kihoon Choi, Anton Koriakin, Chan Young Heo, Jaeseong Lee, Kwon Taek Lim, Yong Hun Kim, Sang Ho Lee
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Publication number: 20210072644Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.Type: ApplicationFiled: September 11, 2020Publication date: March 11, 2021Applicants: SEMES CO., LTD., RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITYInventors: Hae-Won CHOI, Yerim YEON, Anton KORIAKIN, Kihoon CHOI, Youngran KO, Jeong Ho CHO, Hyungseok KANG, Hong Gi MIN
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Patent number: 10915026Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a first process chamber configured to supply a development liquid to a substrate that is carried into the first process chamber after an exposure process is performed on the substrate, a second process chamber configured to treat the substrate through a supercritical fluid, a feeding robot configured to transfer the substrate from the first process chamber to the second process chamber, and a controller configured to control the feeding robot such that the substrate is transferred to the second process chamber in a state in which the development liquid supplied by the first process chamber resides in the substrate.Type: GrantFiled: June 1, 2018Date of Patent: February 9, 2021Assignee: SEMES CO., LTD.Inventors: Hae-Won Choi, Kihoon Choi, Ki-Moon Kang, Chan Young Heo, Anton Koriakin, Jaeseong Lee
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Patent number: 10908503Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.Type: GrantFiled: September 10, 2019Date of Patent: February 2, 2021Assignee: SEMES CO., LTD.Inventors: Kihoon Choi, Chan Young Heo, Do Heon Kim, Hae-Won Choi, Jaeseong Lee, Anton Koriakin, Ji Soo Jeong
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Patent number: 10831103Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.Type: GrantFiled: September 10, 2019Date of Patent: November 10, 2020Assignee: SEMES CO., LTD.Inventors: Kihoon Choi, Chan Young Heo, Do Heon Kim, Hae-Won Choi, Jaeseong Lee, Anton Koriakin, Ji Soo Jeong
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Patent number: 10773281Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.Type: GrantFiled: September 29, 2017Date of Patent: September 15, 2020Assignee: SEMES CO., LTD.Inventors: Ki-Moon Kang, Anton Koriakin, In Il Jung, Hae-Won Choi
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Patent number: 10711228Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a support member which supports a substrate; a treatment liquid discharging member which discharges a treatment liquid containing a monomeric substance to the substrate located in the support member; and a light irradiator which irradiates light to the treatment liquid discharged to the substrate.Type: GrantFiled: July 6, 2018Date of Patent: July 14, 2020Assignee: SEMES CO., LTD.Inventors: Mong-Ryong Lee, Miyoung Jo, Yerim Yeon, Anton Koriakin
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Publication number: 20200126821Abstract: A supercritical processing apparatus includes an upper vessel including a first fluid hole formed in a center thereof, and a lower vessel including a second fluid hole formed in a center thereof. A space is defined between the upper and lower vessels and configured to allow a substrate to be placed therein. The upper vessel further includes a first guide portion provided at a lower portion thereof to be gradually inclined downward toward a periphery thereof from the first fluid hole.Type: ApplicationFiled: October 18, 2019Publication date: April 23, 2020Inventors: Jae Seong LEE, Hae Won CHOI, Ki Hoon CHOI, ANTON KORIAKIN, Chan Young HEO, Do Heon KIM, Ji Soo JEON
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Publication number: 20200115660Abstract: A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.Type: ApplicationFiled: October 11, 2019Publication date: April 16, 2020Inventors: Hae-Won CHOI, Kihoon CHOI, Jaeseong LEE, Chan Young HEO, Anton KORIAKIN, Do Heon KIM, Ji Soo JEONG
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Publication number: 20200081347Abstract: An apparatus for treating a substrate includes a developing chamber that performs a developing process on the substrate by supplying a developing solution, a supercritical chamber that treats the substrate by supplying a supercritical fluid, and a transfer chamber having a transfer unit that transfers the substrate W between the developing chamber and the supercritical chamber.Type: ApplicationFiled: September 10, 2019Publication date: March 12, 2020Inventors: KIHOON CHOI, CHAN YOUNG HEO, DO HEON KIM, HAE-WON CHOI, JAESEONG LEE, ANTON KORIAKIN, JI SOO JEONG