Abstract: A system is disclosed that is using a high energy point like source illuminator comprising an ultraviolet source, where the source is being energized by a variable power supply that is controlled by a UV sensor and microprocessor. The energy from the illuminator is focused in the proximal end of a fiber optic light guide, a feed back branch coupling reflected light to the UV sensor. The light travels inside the guide and exits through its distal end first exposing a standard substrate. The standard substrate and a working substrate are positioned adjacent to each other and the UV light is first directed toward the standard substrate, the reflected light being incident on the sensor. The sensor output signal is then coupled to the microprocessor, which adjusts the power delivered to the bulb to correspond to the value established for the standard substrate, the microprocessor determining the needed exposure time to affect the cure.

Abstract: A system is disclosed that is using a high energy point like source illuminator comprising an ultraviolet source, where the source is being energized by a variable power supply that is controlled by a UV sensor and microprocessor. The energy from the illuminator is focused in the proximal end of a fiber optic light guide, a feed back branch coupling reflected light to the UV sensor. The light travels inside the guide and exits through its distal end first exposing a standard substrate. The standard substrate and a working substrate are positioned adjacent to each other and the UV light is first directed toward the standard substrate, the reflected light being incident on the sensor. The sensor output signal is then coupled to the microprocessor, which adjusts the power delivered to the bulb to correspond to the value established for the standard substrate, the microprocessor determining the needed exposure time to affect the cure.