Abstract: A position sensor for detecting a position of a measurement object, in particular of an optical element of a lithography apparatus is suggested, which includes a transmission coil, a reception coil, which is arranged in such a way that when a transmission signal (Vt, It) is applied to the transmission coil, a reception voltage (Vz, Vx) is generated at the reception coil, and an evaluation device, which links a transmission voltage signal generated in a manner dependent on the transmission signal with a reception voltage signal generated in a manner dependent on the reception voltage and generates a sensor output signal containing information about the relative position of the measurement object with respect to the coils of the position sensor.

Abstract: A system and method allow for a more effective and efficient patterning device architecture and control arrangement. A lithography apparatus comprises an illumination system, a patterning device, and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device is configured to pattern the beam of radiation. The patterning device comprises a control system and an array of individually controllable elements. The control system is configured to convert analog signals having respective first voltage values to corresponding differential control signals having second, higher voltage values. Corresponding ones of the individually controllable elements in the array of individually controllable elements are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate.