Patents by Inventor Anton Potocnik

Anton Potocnik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12336195
    Abstract: The disclosure relates to a trench capacitor device for a superconducting electronic circuit. The trench capacitor device includes a substrate, a first capacitor electrode, and a second capacitor electrode, each electrode including a superconductor and extending into the substrate. The first electrode is circumferentially enclosed by the second electrode such that an inwardly facing surface of the second electrode faces an outwardly facing surface of the first electrode.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: June 17, 2025
    Assignee: IMEC VZW
    Inventor: Anton Potocnik
  • Patent number: 12087994
    Abstract: A method for forming a modified resonator is provided. In one aspect, the method includes obtaining a resonator on top of a substrate, thereby forming an interface area between a bottom surface of the resonator and a top surface of the substrate. The resonator can include niobium or tantalum. The method also includes contacting the resonator and the substrate with a liquid acidic etching solution selected so as to have a higher etch rate towards the substrate than towards the resonator and a nonzero etch rate towards the resonator.
    Type: Grant
    Filed: October 12, 2021
    Date of Patent: September 10, 2024
    Assignees: IMEC vzw, Katholieke Universiteit Leuven
    Inventors: Antoine Pacco, Massimo Mongillo, Anton Potocnik, Danny Wan, Jeroen Verjauw
  • Publication number: 20240297136
    Abstract: Superconducting solder bumps are produced on a qubit substrate by electrodeposition. The substrate comprises qubit areas, and superconducting contact pads connected to the qubit areas. First a protection layer is formed on the substrate, and patterned so as to cover at least the qubit areas. Then one or more thin layers are deposited conformally on the patterned protection layer, the thin layers comprising at least a non-superconducting layer suitable for acting as a seed layer for the electrodeposition of the solder bumps. The seed layer is removed locally in areas which lie within the surface area of respective contact pads. This is done by producing and patterning a mask layer, so that openings are formed therein, and by removing the seed layer from the bottom of the openings. The solder bumps are formed by electrodeposition of the solder material on the bottom of the openings. After the formation of the solder bumps, the seed layer and the protection layer are removed.
    Type: Application
    Filed: February 29, 2024
    Publication date: September 5, 2024
    Inventors: Jaber Derakhshandeh, Vadiraj Manjunath Ananthapadmanabha Rao, Danny Wan, Eric Beyne, Kristiaan De Greve, Anton Potocnik
  • Publication number: 20220285482
    Abstract: The disclosure relates to a trench capacitor device for a superconducting electronic circuit. The trench capacitor device includes a substrate, a first capacitor electrode, and a second capacitor electrode, each electrode including a superconductor and extending into the substrate. The first electrode is circumferentially enclosed by the second electrode such that an inwardly facing surface of the second electrode faces an outwardly facing surface of the first electrode.
    Type: Application
    Filed: February 28, 2022
    Publication date: September 8, 2022
    Inventor: Anton Potocnik
  • Publication number: 20220115759
    Abstract: A method for forming a modified resonator is provided. In one aspect, the method includes obtaining a resonator on top of a substrate, thereby forming an interface area between a bottom surface of the resonator and a top surface of the substrate. The resonator can include niobium or tantalum. The method also includes contacting the resonator and the substrate with a liquid acidic etching solution selected so as to have a higher etch rate towards the substrate than towards the resonator and a nonzero etch rate towards the resonator.
    Type: Application
    Filed: October 12, 2021
    Publication date: April 14, 2022
    Inventors: Antoine Pacco, Massimo Mongillo, Anton Potocnik, Danny Wan, Jeroen Verjauw