Abstract: Apparatuses and a method for gas phase deposition of high aspect ratio molecular structures, HARM-structures, are presented. The first aspect relates to an apparatus configured for oriented gas phase deposition of HARM-structures on a filter. The second aspect relates to an apparatus configured for oriented gas phase deposition of HARM-structures on a substrate. A system comprising multiple apparatuses according to the second aspect is also presented. Elements of the apparatuses are arranged to create a laminar flow of gas comprising HARM-structures in the deposition area, and to direct this flow at least partially parallel to the deposition area. Another aspect of the invention is a method for oriented deposition of HARM-structures, suitable for deposition both on a filter and a substrate.

Abstract: A method for producing nanomaterial comprising carbon is disclosed. The method comprises introducing a combination of two or more carbon sources into a synthesis reactor; decomposing at least partially the two or more carbon sources in the synthesis reactor to release carbon from the two or more carbon sources; and synthesizing the nanomaterial comprising carbon from the released carbon in the synthesis reactor.

Abstract: A method for producing catalyst particles is disclosed and includes forming a solution including a solvent and a material including catalyst material, wherein the material including catalyst material is dissolved or emulsified in the solvent; aerosolizing the formed solution to produce droplets including the material including catalyst material; and treating the droplets to produce catalyst particles or intermediate catalyst particles from the material including catalyst material comprised in the droplets. A method for producing nanomaterials, an apparatus, a catalyst particle and a solution droplet for the production of a catalyst particle are also disclosed.