Patents by Inventor Anton Yasaka

Anton Yasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for repairing a pattern film
    Patent number: 4851097
    Abstract: The present invention relates to an apparatus for repairing a pattern film of a photomask, reticle, X-ray mask, semiconductor, etc. In the apparatus, a focused ion beam is applied to an excess portion of a pattern film which is formed on a substrate. The excess portion of the pattern film is removed by means of ion sputtering. For repairing an excess portion of the pattern film, an etching gas is provided to a position that is being irradiated with the scanning focused ion beam thereby increasing the reliability of repairing and carrying out repair of the excess portion of the pattern film with good quality. Further, the removal speed of the excess portion film is improved.
    Type: Grant
    Filed: December 24, 1987
    Date of Patent: July 25, 1989
    Assignee: Seiko Instruments Inc.
    Inventors: Osamu Hattori, Anton Yasaka, Yoshitomo Nakagawa, Mitsuyoshi Sato, Sumio Sasaki