Patents by Inventor Antonie Gaston Marie KIERS

Antonie Gaston Marie KIERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140199634
    Abstract: During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
    Type: Application
    Filed: March 14, 2014
    Publication date: July 17, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Anna QUAEDACKERS, Paul Christiaan HINNEN, Antonie Gaston Marie KIERS, Christian Marinus LEEWIS