Patents by Inventor Antonie Hendrik Verweij
Antonie Hendrik Verweij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11898601Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: GrantFiled: August 20, 2021Date of Patent: February 13, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
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Patent number: 11442369Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.Type: GrantFiled: November 7, 2018Date of Patent: September 13, 2022Assignee: ASML Netherlands B.V.Inventors: Yang-Shan Huang, Pieter Cornelis Johan De Jager, Rob Reilink, Christiaan Louis Valentin, Jasper Leonardus Johannes Scholten, Antonie Hendrik Verweij, Edwin Van Horne
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Patent number: 11262663Abstract: The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with respect to a longitudinal axis of the tubular linear actuator, and a magnet assembly comprising a series of permanent magnets with alternating polarization direction extending in the longitudinal direction, wherein the magnet assembly is at least partially arranged in the coil assembly and movably with respect to the coil assembly, wherein the tubular coils comprise edge windings.Type: GrantFiled: March 21, 2019Date of Patent: March 1, 2022Assignee: ASML Netherlands B.V.Inventors: Peter Michel Silvester Maria Heijmans, Olof Martinus Josephus Fischer, Maarten Hartger Kimman, Edwin Van Horne, Antonie Hendrik Verweij
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Publication number: 20210381548Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: ApplicationFiled: August 20, 2021Publication date: December 9, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL
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Patent number: 11175596Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.Type: GrantFiled: July 18, 2018Date of Patent: November 16, 2021Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Han-Kwang Nienhuys, Ronald Peter Albright, Jacob Brinkert, Yang-Shan Huang, Hendrikus Gijsbertus Schimmel, Antonie Hendrik Verweij
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Patent number: 11098759Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: GrantFiled: January 6, 2020Date of Patent: August 24, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
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Publication number: 20210080840Abstract: The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with respect to a longitudinal axis of the tubular linear actuator, and a magnet assembly comprising a series of permanent magnets with alternating polarization direction extending in the longitudinal direction, wherein the magnet assembly is at least partially arranged in the coil assembly and movably with respect to the coil assembly, wherein the tubular coils comprise edge windings.Type: ApplicationFiled: March 21, 2019Publication date: March 18, 2021Applicant: ASML Netherlands B.V.Inventors: Peter Michel Silvester Maria HEIJMANS, Olof Martinus Josephus FISCHER, Maarten Hartger KIMMAN, Edwin VAN HORNE, Antonie Hendrik VERWEIJ
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Publication number: 20200333717Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.Type: ApplicationFiled: November 7, 2018Publication date: October 22, 2020Applicant: ASML Netherlands B.V.Inventors: Yang-Shan HUANG, Pieter Cornelis Johan DE JAGER, Rob REILINK, Christiaan Louis VALENTIN, Jasper Leonardus Johannes SCHOLTEN, Antonie Hendrik VERWEIJ, Edwin VAN HORNE
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Publication number: 20200225591Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.Type: ApplicationFiled: July 18, 2018Publication date: July 16, 2020Applicants: ASML Netherlands B,V., ASML Holding N.V.Inventors: Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
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Patent number: 10656536Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.Type: GrantFiled: April 23, 2015Date of Patent: May 19, 2020Assignee: ASML Netherlands B.V.Inventors: Martinus Hendrikus Antonius Leenders, Niek Elout De Kruijf, Mircea Dusa, Martijn Houben, Johannes Gerardus Maria Mulder, Thomas Poiesz, Marco Adrianus Peter Van Den Heuvel, Paul Van Dongen, Justin Johannes Hermanus Gerritzen, Antonie Hendrik Verweij, Abraham Alexander Soethoudt
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Publication number: 20200141445Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: ApplicationFiled: January 6, 2020Publication date: May 7, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL, Mark Constant Johannes BAGGEN
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Patent number: 10527092Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.Type: GrantFiled: October 7, 2015Date of Patent: January 7, 2020Assignee: ASML Netherlands B.V.Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
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Publication number: 20170292566Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess.Type: ApplicationFiled: October 7, 2015Publication date: October 12, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL, Mark Constant Johannes BAGGEN
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Patent number: 9188881Abstract: A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.Type: GrantFiled: May 4, 2010Date of Patent: November 17, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Van Greevenbroek, Antonie Hendrik Verweij
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Publication number: 20120075610Abstract: A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.Type: ApplicationFiled: May 4, 2010Publication date: March 29, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Marcel Mathijs Theodore Marie Dierichs, Markus Franciscus Antonius Eurlings, Hendrikus Robertus Marie Van Greevenbroek, Antonie Hendrik Verweij
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Patent number: 7518705Abstract: The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam; a support constructed to support a first and a second patterning device, each patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the illumination system includes a radiation beam path adaptation device, wherein the adaptation device is configured to adapt a radiation beam path to allow subsequent projections of a pattern of the first patterning device and a pattern of the second patterning device during a single scanning movement of the patterning device support.Type: GrantFiled: September 14, 2006Date of Patent: April 14, 2009Assignee: ASML Netherlands B.V.Inventors: Antonie Hendrik Verweij, Edwin Johan Buis, Hans Butler
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Publication number: 20080070353Abstract: The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam; a support constructed to support a first and a second patterning device, each patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the illumination system includes a radiation beam path adaptation device, wherein the adaptation device is configured to adapt a radiation beam path to allow subsequent projections of a pattern of the first patterning device and a pattern of the second patterning device during a single scanning movement of the patterning device support.Type: ApplicationFiled: September 14, 2006Publication date: March 20, 2008Applicant: ASML Netherlands B.V.Inventors: Antonie Hendrik Verweij, Edwin Johan Buis, Hans Butler