Abstract: The present invention particularly relates to a method for physical vacuum deposition of a coating (R) comprising at least one material (M) on at least a portion of a front face (10) of a support (1), said at least one material (M) originating from an evaporation source or an atomisation source (2), wherein:—use is made of a support (1), at least a portion of the front face (10) of which is smooth, that is to say, does not have any roughness and/or reliefs and/or recesses;—said vacuum deposition is carried out while varying the thickness distribution of the material (M) on said front face (10), that is, while progressively varying the thickness deposited, from a central region (11) in the direction of at least one lateral region (12) contiguous to the central region (11), without modifying the position of the evaporation source or atomisation source (2) of the material particles (M).

Abstract: A photoreflectance device for characterizing a rough surface includes a pump beam emitter to emit a pump beam; a probe beam emitter to emit a probe beam; a detector to detect the probe beam reflected by the surface; an integrating sphere to collect the probe beam reflected by the surface, the integrating sphere including: a first output connected to the detector, and disposed so as to receive a majority of the probe beam reflected by the surface; a second output arranged so as to receive a majority of the pump beam reflected by the surface.

Abstract: A photoreflectance device for characterizing a rough surface includes a pump beam emitter to emit a pump beam; a probe beam emitter to emit a probe beam; a detector to detect the probe beam reflected by the surface; an integrating sphere to collect the probe beam reflected by the surface, the integrating sphere including: a first output connected to the detector, and disposed so as to receive a majority of the probe beam reflected by the surface; a second output arranged so as to receive a majority of the pump beam reflected by the surface.