Patents by Inventor Antonio Casares
Antonio Casares has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11562881Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: October 28, 2021Date of Patent: January 24, 2023Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Publication number: 20220108864Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: ApplicationFiled: October 28, 2021Publication date: April 7, 2022Inventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 11164715Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: September 15, 2020Date of Patent: November 2, 2021Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Publication number: 20200411274Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: ApplicationFiled: September 15, 2020Publication date: December 31, 2020Inventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 10811215Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: GrantFiled: May 20, 2019Date of Patent: October 20, 2020Assignee: Carl Zeiss MultiSEM GmbHInventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Patent number: 10504681Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: May 30, 2017Date of Patent: December 10, 2019Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Publication number: 20190355545Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors.Type: ApplicationFiled: May 20, 2019Publication date: November 21, 2019Inventors: Dirk Zeidler, Stefan Schubert, Ingo Mueller, Joerg Jacobi, Mario Muetzel, Antonio Casares, Christof Riedesel
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Publication number: 20170287674Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: May 30, 2017Publication date: October 5, 2017Inventors: Rainer KNIPPELMEYER, Oliver KIENZLE, Thomas KEMEN, Heiko MUELLER, Stephan UHLEMANN, Maximilian HAIDER, Antonio CASARES, Steven ROGERS
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Patent number: 9673024Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: December 18, 2015Date of Patent: June 6, 2017Assignees: Applied Materials Israel, Ltd., Carl Zeiss Microscopy GmbHInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Patent number: 9653254Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system.Type: GrantFiled: February 5, 2016Date of Patent: May 16, 2017Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Dirk Zeidler, Thomas Kemen, Anger Pascal, Antonio Casares, Christof Riedesel
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Patent number: 9384938Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system.Type: GrantFiled: September 23, 2011Date of Patent: July 5, 2016Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Dirk Zeidler, Thomas Kemen, Pascal Anger, Antonio Casares, Christof Riedesel
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Publication number: 20160155603Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system.Type: ApplicationFiled: February 5, 2016Publication date: June 2, 2016Inventors: Dirk Zeidler, Thomas KEMEN, Anger Pascal, Antonio Casares, Christof Riedesel
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Publication number: 20160111251Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: December 18, 2015Publication date: April 21, 2016Inventors: Rainer KNIPPELMEYER, Oliver KIENZLE, Thomas KEMEN, Heiko MUELLER, Stephan UHLEMANN, Maximilian HAIDER, Antonio CASARES, Steven ROGERS
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Patent number: 9224576Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: January 27, 2014Date of Patent: December 29, 2015Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL, LTD.Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Publication number: 20140158902Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: January 27, 2014Publication date: June 12, 2014Applicants: Applied Materials Israel, Ltd., Carl Zeiss Microscopy GmbHInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
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Patent number: 8637834Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: December 31, 2011Date of Patent: January 28, 2014Assignees: Carl Zeiss Microscopy GmbH, Applied Materials Israel, Ltd.Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximillian Haider, Antonio Casares, Steven Rogers
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Publication number: 20130187046Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system down-stream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system.Type: ApplicationFiled: September 23, 2011Publication date: July 25, 2013Applicants: CARL ZEISS SMT GMBH, APPLIED MATERIALS ISRAEL LTD.Inventors: Dirk Zeidler, Thomas Kemen, Pascal Anger, Antonio Casares, Christof Riedesel
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Publication number: 20120104252Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: ApplicationFiled: December 31, 2011Publication date: May 3, 2012Applicants: Applied Materials Israel Ltd., Carl Zeiss SMT GmbHInventors: Rainer KNIPPELMEYER, Oliver KIENZLE, Thomas KEMEN, Heiko MUELLER, Stephan UHLEMANN, Maximilian HAIDER, Antonio CASARES, Steven ROGERS
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Patent number: 8097847Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first reType: GrantFiled: June 25, 2009Date of Patent: January 17, 2012Assignees: Carl Ziess SMT AG, Applied Materials Isreal LtdInventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares
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Patent number: 8039813Abstract: The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.Type: GrantFiled: September 6, 2006Date of Patent: October 18, 2011Assignees: Carl Zeiss SMT GmbH, Applied Materials Israel LtdInventors: Antonio Casares, Thomas Kemen, Rainer Knippelmeyer, Thomas Bayer, Georg Fritz, Johann Greschner, Samuel Kalt