Patents by Inventor Antonius Arnoldus Meulendijks

Antonius Arnoldus Meulendijks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8269949
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: September 18, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Martinus Petrus Adrianus Vermeulen, Andre Bernardus Jeunink, Erik Roelof Loopstra, Joost Jeroen Ottens, Rene Theodorus Petrus Compen, Peter Smits, Martijn Houben, Hendrikus Johannes Marinus Van Abeelen, Antonius Arnoldus Meulendijks, Rene Wilhelmus Antonius Hubertus Leenaars
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100085551
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
    Type: Application
    Filed: September 21, 2009
    Publication date: April 8, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcus Martinus Petrus Adrianus VERMEULEN, Andre Bernardus JEUNINK, Erik Roelof LOOPSTRA, Joost Jeroen OTTENS, Rene Theodorus Petrus COMPEN, Peter SMITS, Martijn HOUBEN, Hendrikus Johannes Marinus VAN ABEELEN, Antonius Arnoldus MEULENDIJKS, Rene Wilhelmus Antonius Hubertus LEENAARS