Patents by Inventor Antonius Gerardus Theodorus Maria Bastein

Antonius Gerardus Theodorus Maria Bastein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Patent number: 7522263
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: April 21, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Hubert Adriaan Van Mierlo, Gert-Jan Heerens, Hans Meiling, Antonius Gerardus Theodorus Maria Bastein, Jacques Cor Johan Van der Donck, Hedser Van Brug