Patents by Inventor Antonius Johannes Maria Nellissen

Antonius Johannes Maria Nellissen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7154674
    Abstract: An optical image is formed in a radiation-sensitive layer (5), by a number of sub-illuminations, in each of which an array of light valves (21–25) and a corresponding array of converging elements (91–95) are used to form a pattern of spots (111–115) in the resist layer in accordance with a sub-image pattern. Between the sub-illuminations, the resist layer is displaced relative to the arrays. Bright and well-defined spots are obtained by using effective lenses (43) as converging elements. The radiation-sensitive layer may be a resist layer on top of a substrate wherein a device is to be configured by means of lithography or an electrostatic charged layer used in a printer.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: December 26, 2006
    Assignee: Koninklijke Philips Electronics, N.V.
    Inventor: Antonius Johannes Maria Nellissen
  • Patent number: 6657208
    Abstract: The resolution achieved with a proximity printing method and apparatus can be increased considerably by using, instead of a photo mask, a diffraction mask (30) wherein the image information is encoded in a two-dimensional array (32) of image cells (37) having dimensions which are smaller than the minimum feature size to be printed, each image cell having one out of at least two amplitude levels and one out of at least three phase levels. The mask may be a multiple focus mask which has multiple focal planes within one image field.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: December 2, 2003
    Assignee: Koninklijke Philips Electronics N.V.
    Inventor: Antonius Johannes Maria Nellissen
  • Publication number: 20020030800
    Abstract: The resolution achieved with a proximity printing method and apparatus can be increased considerably by using, instead of a photo mask, a diffraction mask (30) wherein the image information is encoded in a two-dimensional array (32) of image cells (37) having dimensions which are smaller than the minimum feature size to be printed, each image cell having one out of at least two amplitude levels and one out of at least three phase levels. The mask may be a multiple focus mask which has multiple focal planes within one image field.
    Type: Application
    Filed: June 21, 2001
    Publication date: March 14, 2002
    Inventor: Antonius Johannes Maria Nellissen