Patents by Inventor Antonius Johannes Van Der Net
Antonius Johannes Van Der Net has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8094287Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.Type: GrantFiled: September 25, 2008Date of Patent: January 10, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
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Publication number: 20090027638Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.Type: ApplicationFiled: September 25, 2008Publication date: January 29, 2009Applicants: ASML NETHERLANDS B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
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Patent number: 7476491Abstract: A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.Type: GrantFiled: September 15, 2004Date of Patent: January 13, 2009Assignee: ASML Netherlands B.V.Inventors: Antonius Johannes Van Der Net, Paul Van Der Veen, Yuri Johannes Gabriel Van De Vijver
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Patent number: 7450215Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.Type: GrantFiled: September 25, 2006Date of Patent: November 11, 2008Assignee: ASML Netherlands B.V.Inventors: Antonius Johannes Van Der Net, Erik Johannus Josephus Van Bragt
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Patent number: 7446849Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.Type: GrantFiled: July 22, 2004Date of Patent: November 4, 2008Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernard Gellrich, Bauke Jansen, Rens Sanderse
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Patent number: 7384149Abstract: A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configure to pattern the projection beam according to a desired patter. The apparatus has a substrate table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and a moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.Type: GrantFiled: July 21, 2003Date of Patent: June 10, 2008Assignees: ASML Netherlands B.V., Entegris, Inc.Inventors: Antonius Johannes Van Der Net, Jeffrey J. Spiegelman, Johannus Josephus Van Bragt
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Patent number: 7227612Abstract: A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.Type: GrantFiled: September 10, 2004Date of Patent: June 5, 2007Assignee: ASML Netherlands B.V.Inventors: Antonius Johannes Van Der Net, Tjarko Adriaan Rudolf Van Empel, Ronald Van Der Ham
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Patent number: 7148949Abstract: In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.Type: GrantFiled: September 11, 2003Date of Patent: December 12, 2006Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Herman Maria Teunissen, Antonius Johannes Van der Net, Willem Lock
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Patent number: 7113254Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.Type: GrantFiled: July 20, 2004Date of Patent: September 26, 2006Assignee: ASML Netherlands B.V.Inventors: Antonius Johannes Van Der Net, Jeffrey J. Spiegelman, Erik Johannus Josephus Van Bragt
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Patent number: 7057702Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.Type: GrantFiled: June 23, 2004Date of Patent: June 6, 2006Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Johannes Catharinus Hubertus Mulkens, Jeroen Johannes Sophia Maria Mertens, Antonius Johannes Van Der Net, Ronald Van Der Ham, Nicolas Lallemant, Marcel Beckers
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Publication number: 20040105080Abstract: In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.Type: ApplicationFiled: September 11, 2003Publication date: June 3, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Franciscus Johannes Herman Maria Teunissen, Antonius Johannes Van der Net, Willem Lock