Patents by Inventor Antonius Johannus Van Der Net
Antonius Johannus Van Der Net has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150109593Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: ApplicationFiled: December 30, 2014Publication date: April 23, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin VAN GOMPEL
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Patent number: 9004459Abstract: A humidifying apparatus is disclosed in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane. The membrane is non-porous to the liquid but porous to vapor of the liquid and is liquidphilic to said liquid.Type: GrantFiled: December 3, 2010Date of Patent: April 14, 2015Assignee: ASML Netherlands B.V.Inventor: Antonius Johannus Van Der Net
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Patent number: 8934082Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: GrantFiled: June 23, 2011Date of Patent: January 13, 2015Assignee: ASML Netherlands B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel
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Patent number: 8885142Abstract: A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.Type: GrantFiled: March 9, 2011Date of Patent: November 11, 2014Assignee: ASML Netherlands B.V.Inventor: Antonius Johannus Van Der Net
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Patent number: 8810769Abstract: A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.Type: GrantFiled: March 17, 2011Date of Patent: August 19, 2014Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Jeroen Gerard Gosen, Antonius Johannus Van Der Net, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li
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Patent number: 8564757Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.Type: GrantFiled: May 12, 2010Date of Patent: October 22, 2013Assignee: ASML Netherlands B.V.Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
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Patent number: 8446561Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.Type: GrantFiled: June 22, 2010Date of Patent: May 21, 2013Assignee: ASML Netherlands B.V.Inventors: Pieter Jacob Kramer, Antonius Johannus Van Der Net, Erik Henricus Egidius Catharina Eummelen, Anthonie Kuijper
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Patent number: 8432531Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.Type: GrantFiled: September 29, 2010Date of Patent: April 30, 2013Assignee: ASML Netherlands B.V.Inventors: Kornelis Tijmen Hoekerd, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
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Publication number: 20130088694Abstract: A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.Type: ApplicationFiled: October 4, 2012Publication date: April 11, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Frank Johannes Jacobus VAN BOXTEL, Antonius Johannus VAN DER NET, Leonarda Hendrika VAN DEN HEUVEL
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Publication number: 20120236275Abstract: Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gaseous environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gaseous environment, the internal gaseous environment being substantially isolated from the external gaseous environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gaseous environment in response to a change in pressure in the external gaseous environment or a pressure differential between the internal gaseous environment or the external gaseous environment.Type: ApplicationFiled: March 13, 2012Publication date: September 20, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Frank Johannes Jacobus VAN BOXTEL, Roelof Frederik De Graaf, Antonius Johannus Van Der Net, Johannes Antonius Maria Martina Van Uijtregt, Leonarda Hendrika Van Den Heuvel
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Publication number: 20120113402Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: November 3, 2011Publication date: May 10, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Publication number: 20110249246Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: ApplicationFiled: June 23, 2011Publication date: October 13, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel
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Publication number: 20110228239Abstract: A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.Type: ApplicationFiled: March 17, 2011Publication date: September 22, 2011Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jeroen Gerard GOSEN, Antonius Johannus Van Der Net, Bart Dinand Paarhuis, Frank Johannes Jacobus Van Boxtel, Jinggao Li
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Patent number: 8004652Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: GrantFiled: April 2, 2008Date of Patent: August 23, 2011Assignee: ASML Netherlands B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel
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Publication number: 20110188013Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: February 22, 2011Publication date: August 4, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Publication number: 20110157568Abstract: A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.Type: ApplicationFiled: March 9, 2011Publication date: June 30, 2011Applicant: ASML NETHERLANDS B.V.Inventor: Antonius Johannus VAN DER NET
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Patent number: 7924404Abstract: A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.Type: GrantFiled: August 16, 2007Date of Patent: April 12, 2011Assignee: ASML Netherlands B.V.Inventor: Antonius Johannus Van Der Net
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Publication number: 20110080567Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.Type: ApplicationFiled: September 29, 2010Publication date: April 7, 2011Applicant: ASML Netherlands B.V.Inventors: Kornelis Tijmen HOEKERD, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
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Publication number: 20110074053Abstract: A humidifying apparatus is disclosed in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane. The membrane is non-porous to the liquid but porous to vapour of the liquid and is liquidphilic to said liquid.Type: ApplicationFiled: December 3, 2010Publication date: March 31, 2011Applicant: ASML Netherlands B.V.Inventor: Antonius Johannus VAN DER NET
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Patent number: 7916269Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: GrantFiled: September 27, 2007Date of Patent: March 29, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk