Abstract: An optical image is formed in a radiation-sensitive layer (5), by a number of sub-illuminations, in each of which an array of light valves (21-25) and a corresponding array of converging elements (91-95) are used to form a pattern of spots (111-115) in the resist layer in accordance with a sub-image pattern. Between the sub-illuminations, the resist layer is displaced relative to the arrays. Bright and well-defined spots are obtained by using refractive lenses (43) as converging elements. The radiation-sensitive layer may be a resist layer on top of a substrate wherein a device is to be configured by means of lithography or an electrostatic charged layer used in a printer.

Abstract: A method of manufacturing a mould for producing a customized optical surface, whereby a mould (1, 2) having a base shape is modified in order to obtain the required shape of the mould. The modificaiton is carried out by means of a lithographic process comprising coating the mould surface with a photoresist layer (16), exposing the layer to a predetermined pattern of exposure radiation (9) and developing the exposed layer whereby portions of the layer are removed to obtain the required mould shape (22). This method may be used for producing small quantities of optical surfaces, such as for individual contact lenses.

Abstract: The invention relates to a method for manufacturing a light emitting display on a substrate comprising the steps of depositing a first electrode layer on or over the substrate, forming a plurality of light emitting layer segments on or over at least a part of the first electrode layer, applying at least one protective layer on or over at least one of the light emitting layer segments and depositing a second electrode layer. By providing a protective layer over the light emitting layer segments more freedom with regard to processing conditions is obtained in depositing and/or patterning of subsequent layers, since the susceptible light emitting layer segments are protected by the protective layers.

Abstract: In a lithographic proximity method for wiring an end or internal side surface of a substrate the required exposure of strips (76), defining the wiring pattern, is performed by means of a mask (70) comprising a diffraction structure (74) to deflect exposure radiation (b) to the side surface. An exposure beam, which is perpendicularly incident on the mask, is used so that enhanced tolerance for proximity gap width variations is obtained. The method allows manufacture of accurate and fine wiring.

Abstract: A method of manufacturing partial layers on lamp bulbs, in which method functional layers are provided in thin-film technology, and which method comprises at least the steps of: providing a temporary layer on that region of the lamp bulb which will have no functional layer in the operational state of the lamp, subsequently providing the functional layer on the entire surface of the lamp bulb, and detaching the temporary layer together with the functional layer present thereon.

Abstract: An optical image is formed in a radiation-sensitive layer (5), by a number of sub-illuminations, in each of which an array of light valves (21-25) and a corresponding array of converging elements (91-95) are used to form a pattern of spots (111-115) in the resist layer in accordance with a sub-image pattern. Between the sub-illuminations, the resist layer is displaced relative to the arrays. Bright and well-defined spots are obtained by using effective lenses (43) as converging elements. The radiation-sensitive layer may be a resist layer on top of a substrate wherein a device is to be configured by means of lithography or an electrostatic charged layer used in a printer.