Patents by Inventor Antonius Theodoras Anna Maria DERKSEN

Antonius Theodoras Anna Maria DERKSEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190086821
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Application
    Filed: November 19, 2018
    Publication date: March 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Antonius Theodoras Anna Maria DERKSEN, Joeri LOF, Klaus SIMON, Alexander STRAAIJER