Patents by Inventor Antonius Theodorus Maria Bastein

Antonius Theodorus Maria Bastein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method
    Publication number: 20070146657
    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.
    Type: Application
    Filed: December 27, 2005
    Publication date: June 28, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hubert Mierlo, Gert-Jan Heerens, Hans Meiling, Antonius Theodorus Maria Bastein, Jacques Donck, Hedser Brug