Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Abstract: The present invention provides a portable air treatment device to supply filtered air to a person. The device comprises an air pump to provide a flow of air, a filter device to filter the flow of air, a breathing mask configured to supply the flow of air to the person, and a control unit configured to control the pump for adjusting the flow of air. The control unit is configured to control the pump for adjusting the flow of air in order to maintain a desired pressure difference between the pressure in the interior of the breathing mask and the ambient air.

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Abstract: A street lighting arrangement for providing light distribution over an angular range between an axis and a cut-off angle, the arrangement comprising a first array (1) of at least one LED (2) having a substantially planar distribution pattern, the first array being directed at an angle intermediate to the axis and the cut-off angle, a second array of at least one LED having a substantially planar distribution pattern, the second array being directed at an angle intermediate to the axis and the cut-off angle and generally opposite to the first array, a first reflector (14) directed to receive light from the first array (1) beyond the cut-off angle and reflect it as a substantially parallel beam in the direction of the second array at close to the cut-off angle and a second reflector directed to receive light from the second array beyond the cut-off angle and reflect it as a substantially parallel beam in the direction of the first array (1) and at close to the cut-off angle.

Abstract: A street lighting arrangement for providing light distribution over an angular range between an axis and a cut-off angle, the arrangement comprising a first array (1) of at least one LED (2) having a substantially planar distribution pattern, the first array being directed at an angle intermediate to the axis and the cut-off angle, a second array of at least one LED having a substantially planar distribution pattern, the second array being directed at an angle intermediate to the axis and the cut-off angle and generally opposite to the first array, a first reflector (14) directed to receive light from the first array (1) beyond the cut-off angle and reflect it as a substantially parallel beam in the direction of the second array at close to the cut-off angle and a second reflector directed to receive light from the second array beyond the cut-off angle and reflect it as a substantially parallel beam in the direction of the first array (1) and at close to the cut-off angle.