Patents by Inventor Antonius Wismans

Antonius Wismans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Imprint lithography
    Publication number: 20070237886
    Abstract: An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.
    Type: Application
    Filed: March 31, 2006
    Publication date: October 11, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Dijksman, Antonius Wismans, Anke Pierik, Martin Vernhout, Sander Wuister, Yvonne Kruijt-Stegeman