Patents by Inventor Aoki Kei

Aoki Kei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymerizable compound and polymer therefrom
    Patent number: 5248749
    Abstract: A homopolymer or a copolymer comprises a polymerizable compound represented by formula (I):A--X--COCOOR.sub.1 (I)whereinR.sub.1 represents a hydrogen atom, a C.sub.1 -C.sub.5 alkyl group or an aryl group;X represents an oxygen atom, a sulfur atom, --COO-- or --NR.sub.5 --whereinR.sub.5 is a hydrogen atom or a C.sub.1 -C.sub.5 alkyl group;A represents a C.sub.3 -C.sub.18 alkenyl, alkynyl, alkenylaryl or alkenylaralkyl group, or a group represented by: ##STR1## wherein R.sub.2 and R.sub.3, which may be the same or different, independently represent a hydrogen atom or a C.sub.1 -C.sub.5 alkyl group;Y represents an oxygen atom or --NR.sub.4 -- wherein R.sub.4 represents a hydrogen atom or a C.sub.1 -C.sub.5 alkyl group; n is an integer of 1 to 5; m is an integer of 1 to 10; and l is 0 or an integer of 1 to 20;with the proviso that if Y is present, X is not --NR.sub.5 --. Additionally, disclosed are processes of preparing the homopolymer or copolymer as well as the polymerizable compound.
    Type: Grant
    Filed: April 1, 1992
    Date of Patent: September 28, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Urano Satoshi, Aoki Kei, Tomita Nobuaki, Mori Hirohiko
  • Poly(alpha-ketoester) compound and production thereof
    Patent number: 5102951
    Abstract: The present invention provides a poly(alpha-ketoester) compound represented by the formula (1): ##STR1## wherein G is a residue of an active hydrogen-containing compound G-(X-H).sub.n, or an alkyl, aryl, aralkyl, alkenyl, alkynyl group having 3 to 20 carbon atoms which may contain oxygen or nitrogen atoms, or a polymeric compound residue, X is a oxygen atom or --CH.sub.2, n is an integer of 3 to 1,000, R.sub.1 is a hydrogen atom, a C.sub.1 -C.sub.5 alkyl group or an aryl group, and a production thereof.
    Type: Grant
    Filed: September 4, 1991
    Date of Patent: April 7, 1992
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Aoki Kei, Takagawa Ryozo, Tomita Nobuaki, Mori Hirohiko
  • Poly(alpha-Ketoester) compound and production thereof
    Patent number: 5081183
    Abstract: The present invention provides a poly(alpha-ketoester) compound represented by the formula (1); ##STR1## wherein G is a residue of an active hydrogen-containing compound G--(X--H).sub.n, or an alkyl, aryl, aralkyl, alkenyl, alkynyl group having 3 to 20 carbon atoms which may contain oxygen or nitrogen atoms, or a polymeric compound residue, X is an oxygen atom or --CH.sub.2, n is an integer of 3 to 1,000, R.sub.1 is a hydrogen atom, a C.sub.1 -C.sub.5 alkyl group or an aryl group, and a production thereof.
    Type: Grant
    Filed: January 12, 1990
    Date of Patent: January 14, 1992
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Aoki Kei, Takagawa Ryozo, Tomita Nobuaki, Mori Hirohiko