Patents by Inventor Arbel ENGLANDER

Arbel ENGLANDER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CD-SEM technique for wafers fabrication control
    Patent number: 9824852
    Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.
    Type: Grant
    Filed: December 31, 2015
    Date of Patent: November 21, 2017
    Assignee: Applied Materials Israel Ltd
    Inventors: Roman Kris, Yakov Weinberg, Yan Ivanchenko, Ishai Schwarzband, Dan Lange, Arbel Englander, Efrat Noifeld, Ran Goldman, Ori Shoval
  • CD-SEM TECHNIQUE FOR WAFERS FABRICATION CONTROL
    Publication number: 20170194125
    Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.
    Type: Application
    Filed: December 31, 2015
    Publication date: July 6, 2017
    Inventors: Roman KRIS, Yakov WEINBERG, Yan IVANCHENKO, Ishai SCHWARZBAND, Dan LANGE, Arbel ENGLANDER, Efrat NOIFELD, Ran GOLDMAN, Ori SHOVAL