Patents by Inventor Archana Subramaniyan

Archana Subramaniyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Advanced self-aligned patterning process with sit spacer as a final dielectric etch hardmask
    Patent number: 9704746
    Abstract: A method of forming a metallization layer by ASAP is provided. Embodiments include forming an ULK layer; forming a SAC SiN layer over the ULK layer; forming mandrels directly on the SAC SiN layer; cutting the mandrels; selectively etching the SAC SiN layer across the cut mandrels, forming first trenches; filling the first trenches with a metal oxide; forming a conformal metal oxide layer over the cut mandrels, the metal oxide, and the SAC SiN layer; removing horizontal portions of the conformal metal oxide layer over the cut mandrels and the SAC SiN layer; removing the cut mandrels; removing exposed portions of the SAC SiN layer and etching the underlying ULK layer, forming second trenches; and stripping a remainder of the metal oxide, conformal metal oxide layer, and SAC SiN layer.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: July 11, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Jiehui Shu, Jinping Liu, Archana Subramaniyan