Patents by Inventor Arend Johannes DONKERBROEK
Arend Johannes DONKERBROEK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11796921Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.Type: GrantFiled: January 30, 2020Date of Patent: October 24, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Arend Johannes Donkerbroek, Yassin Chowdhury, Maurice Henricus Franciscus Janssen
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Patent number: 11774868Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.Type: GrantFiled: April 7, 2020Date of Patent: October 3, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Nirupam Banerjee, Johan Franciscus Maria Beckers, Peter Brakhage, Arend Johannes Donkerbroek, Daniel Grimm, Tim Rathje, Martin Tilke, Sandro Wricke
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Publication number: 20220163896Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.Type: ApplicationFiled: April 7, 2020Publication date: May 26, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Nirupam BANERJEE, Johan Franciscus Maria BECKERS, Peter BRAKHAGE, Arend Johannes DONKERBROEK, Daniel GRIMM, Tim RATHJE, Martin TILKE, Sandro WRICKE
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Publication number: 20220100102Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.Type: ApplicationFiled: January 30, 2020Publication date: March 31, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Arend Johannes DONKERBROEK, Yassin CHOWDHURY, Maurice Henricus Franciscus JANSSEN
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Patent number: 11137695Abstract: Method of measuring a height profile of one or more substrates is provided comprising measuring a first height profile of one or more fields on a substrate using a first sensor arrangement, the first height profile being the sum of a first interfield part and a first intrafield part, measuring a second height profile of one or more further fields on the substrate or on a further substrate using a second sensor arrangement, the second height profile being the sum of a second interfield part and a second intrafield part, determining from the measurements with the first sensor arrangement an average first intrafield part, and determining the height profile of the further fields from the second interfield part and the average first intrafield part thereby correcting the measurements of the second sensor arrangement.Type: GrantFiled: September 8, 2017Date of Patent: October 5, 2021Assignee: ASML Netherlands B.V.Inventors: Arend Johannes Donkerbroek, Jeroen Cottaar, Thomas Theeuwes, Erik Johan Koop
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Patent number: 10845719Abstract: A method of controlling a lithographic apparatus to manufacture a plurality of devices, the method including: obtaining a parameter map representing a parameter variation across a substrate by measuring the parameter at a plurality of points on the substrate; decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations; deriving a scale factor, configured to correct for errors in measurement of the parameter variation, from measurements of a second parameter of a substrate; and controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.Type: GrantFiled: December 20, 2017Date of Patent: November 24, 2020Assignee: ASML Netherlands B.V.Inventors: Rene Marinus Gerardus Johan Queens, Wolfgang Helmut Henke, Arend Johannes Donkerbroek, Jeroen Cottaar
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Publication number: 20190384188Abstract: A method of controlling a lithographic apparatus to manufacture a plurality of devices, the method including: obtaining a parameter map representing a parameter variation across a substrate by measuring the parameter at a plurality of points on the substrate; decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations; deriving a scale factor, configured to correct for errors in measurement of the parameter variation, from measurements of a second parameter of a substrate; and controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.Type: ApplicationFiled: December 20, 2017Publication date: December 19, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Rene Marinus Gerardus Johan QUEENS, Wolfgang Helmut HENKE, Arend Johannes DONKERBROEK, Jeroen COTTAAR
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Patent number: 10503087Abstract: A lithographic apparatus uses a height sensor to obtain height sensor data representing a topographical variation across a substrate. The height sensor data is used to control focusing of a device pattern at multiple locations across the substrate. A controller identifies one or more first areas where height sensor data is judged to be reliable and one or more second areas where the height sensor data is judged to be less reliable. Substitute height data is calculated for the second areas using height sensor data for the first areas together with prior knowledge of expected device-specific topography. The focusing of the lithographic apparatus is controlled using a combination of the height data from the sensor and the substitute height data.Type: GrantFiled: August 23, 2016Date of Patent: December 10, 2019Assignee: ASML Netherlands B.V.Inventors: Rene Marinus Gerardus Johan Queens, Arend Johannes Donkerbroek, Pietro Andricciola, Ewoud Frank Van West
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Publication number: 20190294060Abstract: Method of measuring a height profile of one or more substrates is provided comprising measuring a first height profile of one or more fields on a substrate using a first sensor arrangement, the first height profile being the sum of a first interfield part and a first intrafield part, measuring a second height profile of one or more further fields on the substrate or on a further substrate using a second sensor arrangement, the second height profile being the sum of a second interfield part and a second intrafield part, determining from the measurements with the first sensor arrangement an average first intrafield part, and determining the height profile of the further fields from the second interfield part and the average first intrafield part thereby correcting the measurements of the second sensor arrangement.Type: ApplicationFiled: September 8, 2017Publication date: September 26, 2019Applicant: ASML Nethertands B.V.Inventors: Arend Johannes DONKERBROEK, Jeroen COTTAAR, Thomas THEEUWES, Erik Johan KOOP
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Publication number: 20180239267Abstract: A lithographic apparatus uses a height sensor to obtain height sensor data representing a topographical variation across a substrate. The height sensor data is used to control focusing of a device pattern at multiple locations across the substrate. A controller identifies one or more first areas where height sensor data is judged to be reliable and one or more second areas where the height sensor data is judged to be less reliable. Substitute height data is calculated for the second areas using height sensor data for the first areas together with prior knowledge of expected device-specific topography. The focusing of the lithographic apparatus is controlled using a combination of the height data from the sensor and the substitute height data.Type: ApplicationFiled: August 23, 2016Publication date: August 23, 2018Applicant: ASML Netherlands B.V.Inventors: Rene Marinus Gerardus Johan QUEENS, Arend Johannes DONKERBROEK, Pietro ANDRICCIOLA, Ewoud Frank VAN WEST