Patents by Inventor Arend Johannes Kisteman

Arend Johannes Kisteman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining focus corrections, lithographic processing cell and device manufacturing method
    Patent number: 9360770
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
  • Method of determining focus corrections, lithographic processing cell and device manufacturing method
    Patent number: 9360769
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: June 7, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers
  • Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method
    Publication number: 20150085267
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Application
    Filed: December 5, 2014
    Publication date: March 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arend Johannes KISTEMAN, Wim Tjibbo TEL, Thomas THEEUWES, Antoine Gaston Marie KIERS
  • Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method
    Publication number: 20130050668
    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.
    Type: Application
    Filed: August 10, 2012
    Publication date: February 28, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Arend Johannes Kisteman, Wim Tjibbo Tel, Thomas Theeuwes, Antoine Gaston Marie Kiers