Patents by Inventor Ariando

Ariando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250194430
    Abstract: A magnetic device includes a magnetic layer having a ferromagnetic phase to support magnetic skyrmions and an antiferromagnetic phase to annihilate magnetic skyrmions. The magnetic layer transmits between the ferromagnetic and antiferromagnetic phases. A ferroelectric layer is adapted to magnetoelectrically couple with the magnetic layer causing the magnetic layer to transit between the ferromagnetic and antiferromagnetic phases in response to a polarization state of the ferroelectric layer. The polarization state includes a first polarization state corresponding to the ferromagnetic state and a second polarization state corresponding to the antiferromagnetic state. First and second electrodes can be configured to sandwich the magnetic and ferroelectric layers.
    Type: Application
    Filed: December 12, 2023
    Publication date: June 12, 2025
    Inventors: Zhi Shiuh Lim, Ariando, Changjian Li
  • Publication number: 20230146990
    Abstract: The present invention relates, in general terms, to magnetoresistance sensors and methods of fabrication thereof. The magnetoresistance sensor comprises a continuous graphene layer disposed on a corrugated and/or stepped surface of a substrate. At least two conductive elements are in contact with the graphene layer. The graphene layer substantially conforms to the corrugated and/or stepped surface of the substrate.
    Type: Application
    Filed: March 4, 2021
    Publication date: May 11, 2023
    Inventors: Junxiong HU, Ariando, Jun You Tam, Gavin Kok Wai Koon, Antonio Helio Castro Nato
  • Patent number: 9269773
    Abstract: An article includes a layer of graphene having a first work function; and a metal oxide film disposed on the layer of graphene, the metal oxide film having a second work function greater than the first work function. Electrons are transferred from the layer of graphene to the metal oxide film, forming a hole accumulation layer in the layer of graphene.
    Type: Grant
    Filed: May 5, 2011
    Date of Patent: February 23, 2016
    Assignee: National University of Singapore
    Inventors: Wei Chen, Zhenyu Chen, Thye Shen Andrew Wee, Lanfei Xie, Xiao Wang, Jiatao Sun, Ariando
  • Publication number: 20130048952
    Abstract: An article includes a layer of graphene having a first work function; and a metal oxide film disposed on the layer of graphene, the metal oxide film having a second work function greater than the first work function. Electrons are transferred from the layer of graphene to the metal oxide film, forming a hole accumulation layer in the layer of graphene.
    Type: Application
    Filed: May 5, 2011
    Publication date: February 28, 2013
    Applicant: National University of Singapore
    Inventors: Wei Chen, Zhenyu Chen, Thye Shen Andrew Wee, Lanfei Xie, Xiao Wang, Jiatao Sun, Ariando