Patents by Inventor Arie Boef

Arie Boef has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment system and method
    Publication number: 20080088956
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Application
    Filed: November 29, 2007
    Publication date: April 17, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Maarten Hoogerland, Boguslaw Gajdeczko
  • Latent overlay metrology
    Publication number: 20060109463
    Abstract: An apparatus and method for improved latent overlay metrology is disclosed. In an embodiment, a scatterometer and an overexposed overlay target are used to obtain more robust overlay measurement.
    Type: Application
    Filed: November 22, 2004
    Publication date: May 25, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Jacobus Burghoorn, Mircea Dusa, Antoine Kiers, Maurits Schaar
  • Method and apparatus for angular-resolved spectroscopic lithography characterization
    Publication number: 20060066855
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
    Type: Application
    Filed: August 15, 2005
    Publication date: March 30, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Arno Bleeker, Youri Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Kiers, Paul Luehrmann, Henricus Pellemans, Maurits Schaar, Cedric Grouwstra, Markus Van Kraaij
  • Alignment system and method
    Publication number: 20060007446
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Application
    Filed: August 25, 2005
    Publication date: January 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Arie Boef, Maarten Hoogerland, Boguslaw Gajdeczko