Patents by Inventor Aritaka Hishida
Aritaka Hishida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11698586Abstract: A negative working, aqueous base developable, photosensitive photoresist composition and a process of using this composition to produce lithographic images, where this composition is one comprising: a) a polymer containing the four repeat units of structures (1), (2), (3), and (4), but no other types of repeat units; wherein v, x, y and z, respectively, represent the mole % of each repeat units of structures (1), (2), (3) and (4); b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from about 360 nm to about 440 nm; c) a crosslinker component which is either a mixture consisting of crosslinkers of structure (5), (6) and (7), or a single crosslinker of structure (8); d) a radical inhibitor component; e) an optional surfactant component; f) an optional dissolution promoter component; and g) a solvent. The invention also relates to the process of using this negative resist to produce lithographic images.Type: GrantFiled: March 20, 2019Date of Patent: July 11, 2023Assignee: Merck Patent GmbHInventors: Aritaka Hishida, Hisashi Motobayashi, Lei Lu, Chunwei Chen, PingHung Lu, Weihong Liu
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Publication number: 20220119568Abstract: To provide a novel polymer capable of reducing sublimate during film formation and a composition comprising the same. The polymer (A) according to the present invention comprises at least one structural unit selected from the group consisting of Unit (a), Unit (b), Unit (c) and Unit (d) having certain structures, wherein, na, nb, nc and nd, which are the numbers of repetition respectively of Units (a), (b), (c) and (d), satisfy the following formulae: na+nb>0, nc?0 and nd?0.Type: ApplicationFiled: February 17, 2020Publication date: April 21, 2022Inventors: Hiroshi HITOKAWA, Tomohide KATAYAMA, Tomotsugu YANO, Rul ZHANG, Aritaka HISHIDA, Masato SUZUKI, Rikio KOZAKI, Toshiya OKAMURA
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Patent number: 10976662Abstract: The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.Type: GrantFiled: April 18, 2017Date of Patent: April 13, 2021Assignee: Merck Patent GmbHInventors: Weihong Liu, PingHung Lu, Chunwei Chen, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida
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Publication number: 20200393758Abstract: The present invention relates to a negative working, aqueous base developable, photosensitive photoresist composition comprising: a) a polymer containing the four repeat units of structures (1), (2), (3), and (4), but no other types of repeat units; wherein v, x, y and z, respectively, represent the mole % of each repeat units of structures (1), (2), (3) and (4); b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from about 360 nm to about 440 nm; c) a crosslinker component which is either a mixture consisting of crosslinkers of structure (5), (6) and (7), or a single crosslinker of structure (8); d) a radical inhibitor component; e) an optional surfactant component; f) an optional dissolution promoter component; and g) a solvent. The invention also relates to the process of using this negative resist to produce lithographic images.Type: ApplicationFiled: March 20, 2019Publication date: December 17, 2020Inventors: Aritaka HISHIDA, Hisashi MOTOBAYASHI, Lei LU, Chunwei CHEN, PingHung LU, Weihong LIU
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Publication number: 20190064662Abstract: The present application for patent relates to a light-sensitive positive working photosensitive composition especially useful for imaging thick films using a composition which gives very good film uniformity and promotes a good process latitude against feature pattern collapse in patterns created upon imaging and developing of these films.Type: ApplicationFiled: April 18, 2017Publication date: February 28, 2019Inventors: Weihong LIU, PingHung LU, Chunwei CHEN, SookMee LAI, Yoshiharu SAKURAI, Aritaka HISHIDA
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Patent number: 8841062Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.Type: GrantFiled: December 4, 2012Date of Patent: September 23, 2014Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Weihong Liu, Ping-Hung Lu, Medhat Toukhy, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida
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Publication number: 20140154624Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.Type: ApplicationFiled: December 4, 2012Publication date: June 5, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Weihong LIU, Ping-Hung LU, Medhat TOUKHY, SookMee LAI, Yoshiharu SAKURAI, Aritaka HISHIDA
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Patent number: 8039202Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 24, 2007Date of Patent: October 18, 2011Assignee: AZ Electronic Materials USA Corp.Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark O. Neisser, Tomohide Katayama, Shuji S. Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Patent number: 7824837Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: GrantFiled: October 22, 2007Date of Patent: November 2, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Mark O. Neisser, Shuji S Ding-Lee, Aritaka Hishida, Joseph E. Oberlander, Medhat E. Toukhy
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Patent number: 7691556Abstract: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.Type: GrantFiled: June 22, 2005Date of Patent: April 6, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Aritaka Hishida, Jianhui Shan, Hong Zhuang
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Publication number: 20080090184Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: ApplicationFiled: October 24, 2007Publication date: April 17, 2008Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide Katayama, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy
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Publication number: 20080038666Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: ApplicationFiled: October 22, 2007Publication date: February 14, 2008Inventors: Hengpeng Wu, Mark Neisser, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy
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Publication number: 20060058468Abstract: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.Type: ApplicationFiled: June 22, 2005Publication date: March 16, 2006Inventors: Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Aritaka Hishida, Jianhui Shan, Hong Zhuang
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Publication number: 20060057501Abstract: The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with a reactive compound containing hydroxy groups and/or acid groups, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.Type: ApplicationFiled: September 15, 2004Publication date: March 16, 2006Inventors: Hengpeng Wu, Shuji Ding-Lee, Zhong Xiang, Aritaka Hishida, Jianhui Shan
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Publication number: 20050214674Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.Type: ApplicationFiled: March 25, 2004Publication date: September 29, 2005Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide Katayama, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy
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Patent number: 6358665Abstract: Disclosed is a chemically amplified radiation sensitive composition containing a hydroxystyrene resin and an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator, wherein the photoacid generator is a sulfonium or iodonium salt of a fluorinated alkane sulfonic acid, represented by formula (I): Y+ASO3− (I) wherein A represents CF3CHFCF2 or CF3CF2CF2CF2; and Y represents wherein R1, R2, R3, R4, and R5 each independently represent an alkyl group, a monocyclic or bicyclic alkyl group, a cyclic alkylcarbonyl group, a phenyl group, a naphthyl group, an anthryl group, a peryl group, a pyryl group, a thienyl group, an aralkyl group, or an arylcarbonylmethylene group, or any two of R1, R2, and R3 or R4 and R5 together represent an alkylene or an oxyalkylene which forms a five- or six-membered ring together with the interposing sulfur or iodine, said ring being optionally condensed with aryl groups.Type: GrantFiled: July 3, 2000Date of Patent: March 19, 2002Assignee: Clariant International Ltd.Inventors: Georg Pawlowski, Hiroshi Okazaki, Yoshiaki Kinoshita, Naoko Tsugama, Aritaka Hishida, Xiao-Ming Ma, Yuko Yamaguchi