Patents by Inventor Arjan Meijer

Arjan Meijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210292644
    Abstract: The present invention relates to a light luminescent particle, use of the light luminescent particle and method for preparation of the light luminescent particle. The present invention further relates to composition, an optical medium, and an optical device and method for preparation of thereof.
    Type: Application
    Filed: September 7, 2017
    Publication date: September 23, 2021
    Applicant: Merck Patent GmbH
    Inventor: Arjan MEIJER
  • Publication number: 20200017763
    Abstract: The present invention relates to an optical medium (100) and an optical device (200) comprising an optical medium (100). The present invention further relates to a use of the optical medium (100) in an optical device (200). The invention further more relates to method for preparing the optical medium (100) and method for preparing the optical device (200).
    Type: Application
    Filed: December 18, 2017
    Publication date: January 16, 2020
    Applicant: Merck Patent GmbH
    Inventors: Christian MATUSCHEK, Arjan MEIJER, Itai LIEBERMAN, Ralf GROTTENMUELLER
  • Publication number: 20190270932
    Abstract: The present invention relates to a light luminescent particle comprising a nanosized light emitting material, and use of said light luminescent particle. The present invention further relates to a composition comprising a light luminescent particle, an optical medium, and an optical device. The present invention also relates to method for preparing of said luminescent particle.
    Type: Application
    Filed: November 8, 2017
    Publication date: September 5, 2019
    Applicant: Merck Patent GmbH
    Inventor: Arjan MEIJER
  • Patent number: 8999186
    Abstract: The present invention relates to a method for selectively etching and patterning with high resolution of flexible polymer matrices, which may comprise Ag nano tubes.
    Type: Grant
    Filed: March 28, 2012
    Date of Patent: April 7, 2015
    Assignee: Merck Patent GmbH
    Inventors: Arjan Meijer, Werner Stockum, Ingo Koehler
  • Patent number: 8809112
    Abstract: The present invention refers to a method for selectively structuring of a polymer matrix comprising CNT (carbon nano tubes) on a flexible plastic substructure. The method also includes a suitable etching composition, which allows to proceed the method in a mass production.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: August 19, 2014
    Assignee: Merck Patent GmbH
    Inventors: Werner Stockum, Arjan Meijer, Ingo Koehler
  • Publication number: 20140054260
    Abstract: The present invention relates to a method for selectively etching and patterning with high resolution of flexible polymer matrices, which may comprise Ag nano tubes.
    Type: Application
    Filed: March 28, 2012
    Publication date: February 27, 2014
    Applicant: MERCK PATENT GMBH
    Inventors: Arjan Meijer, Werner Stockum, Ingo Koehler
  • Publication number: 20130065359
    Abstract: The present invention refers to a method for selectively structuring of a polymer matrix comprising CNT (carbon nano tubes) on a flexible plastic substructure. The method also includes a suitable etching composition, which allows to proceed the method in a mass production.
    Type: Application
    Filed: April 26, 2011
    Publication date: March 14, 2013
    Applicant: MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
    Inventors: Werner Stockum, Arjan Meijer, Ingo Koehler
  • Patent number: 8318613
    Abstract: The present invention relates to compositions, which are useful for the generation of patterned or structured SiO2-layers or of SiO2-lines during the manufacturing process of semiconductor devices, and which are suitable for the application in inkjet operations. The present invention also relates to a modified process of manufacturing semiconductor devices taking advantage of these new compositions.
    Type: Grant
    Filed: March 2, 2009
    Date of Patent: November 27, 2012
    Assignee: Merck Patent GmbH
    Inventors: Werner Stockum, Ingo Koehler, Arjan Meijer, Paul Craig Brookes, Katie Patterson, Mark James
  • Publication number: 20110021037
    Abstract: The present invention relates to compositions, which are useful for the generation of patterned or structured SiO2-layers or of SiO2-lines during the manufacturing process of semiconductor devices, and which are suitable for the application in inkjet operations. The present invention also relates to a modified process of manufacturing semiconductor devices taking advantage of these new compositions.
    Type: Application
    Filed: March 2, 2009
    Publication date: January 27, 2011
    Applicant: MERCK PATENT GESELLSCHAFT
    Inventors: Werner Stockum, Ingo Koehler, Arjan Meijer, Paul Craig Brookes, Katie Patterson, Mark James