Patents by Inventor Arjen Boogaard
Arjen Boogaard has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10444644Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: November 21, 2018Date of Patent: October 15, 2019Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Publication number: 20190086820Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: November 21, 2018Publication date: March 21, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus DONDERS, Hans JANSEN, Arjen BOOGAARD
-
Patent number: 10228615Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm?3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.Type: GrantFiled: July 2, 2015Date of Patent: March 12, 2019Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Arjen Boogaard, Florian Didier Albin Dhalluin, Alexey Sergeevich Kuznetsov, Mária Péter, Luigi Scaccabarozzi, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Andrei Mikhailovich Yakunin
-
Patent number: 10146143Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: October 26, 2017Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Publication number: 20180046095Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: October 26, 2017Publication date: February 15, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus DONDERS, Hans JANSEN, Arjen BOOGAARD
-
Patent number: 9804509Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: March 7, 2017Date of Patent: October 31, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Patent number: 9773578Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.Type: GrantFiled: January 14, 2014Date of Patent: September 26, 2017Assignee: ASML Netherlands B.V.Inventors: Alexey Sergeevich Kuznetsov, Arjen Boogaard, Jeroen Marcel Huijbregtse, Andrey Nikipelov, Maarten Van Kampen
-
Publication number: 20170205704Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm?3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.Type: ApplicationFiled: July 2, 2015Publication date: July 20, 2017Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich BANINE, Jozef Petrus Henricus BENSCHOP, Arjen BOOGAARD, Florian Didier Albin DHALLUIN, Alexey Sergeevich KUZNETSOV, Mária PÉTER, Luigi SCACCABAROZZI, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Andrei Mikhailovich YAKUNIN
-
Publication number: 20170176876Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: March 7, 2017Publication date: June 22, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus DONDERS, Hans JANSEN, Arjen BOOGAARD
-
Patent number: 9594308Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: November 13, 2015Date of Patent: March 14, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Publication number: 20160070178Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: November 13, 2015Publication date: March 10, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus DONDERS, Hans JANSEN, Arjen BOOGAARD
-
Publication number: 20160012929Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.Type: ApplicationFiled: January 14, 2014Publication date: January 14, 2016Applicant: ASML Netherlands B.V.Inventors: Alexey Sergeevich KUZNETSOV, Arjen BOOGAARD, Jeroen Marcel HUIJBREGTSE, Andrey NIKIPELOV, Maarten VAN KAMPEN
-
Patent number: 9213247Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: April 25, 2014Date of Patent: December 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Publication number: 20140313494Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: April 25, 2014Publication date: October 23, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Patent number: 8830446Abstract: An extreme ultraviolet exposure apparatus includes a radiation system configured to supply a beam of extreme ultraviolet radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam of extreme ultraviolet radiation according to a desired pattern; a substrate table having an area configured to support a substrate; a projection system configured to project the patterned beam of extreme ultraviolet radiation onto a target portion of the substrate, the projection system comprising a reflective optical system; wherein at least a part of the apparatus that during use of the apparatus is exposed to the beam of extreme ultraviolet radiation is coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.Type: GrantFiled: June 26, 2013Date of Patent: September 9, 2014Assignee: ASML Netherlands B.V.Inventors: Arjen Boogaard, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Antonius Spee
-
Patent number: 8711333Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: June 4, 2009Date of Patent: April 29, 2014Assignee: ASML Netherlands B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
-
Publication number: 20130286374Abstract: An extreme ultraviolet exposure apparatus includes a radiation system configured to supply a beam of extreme ultraviolet radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam of extreme ultraviolet radiation according to a desired pattern; a substrate table having an area configured to support a substrate; a projection system configured to project the patterned beam of extreme ultraviolet radiation onto a target portion of the substrate, the projection system comprising a reflective optical system; wherein at least a part of the apparatus that during use of the apparatus is exposed to the beam of extreme ultraviolet radiation is coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.Type: ApplicationFiled: June 26, 2013Publication date: October 31, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Arjen BOOGAARD, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Antonius Spee
-
Patent number: 8542341Abstract: An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.Type: GrantFiled: September 26, 2008Date of Patent: September 24, 2013Assignee: ASML Netherlands B.V.Inventors: Arjen Boogaard, Timotheus Franciscus Sengers, Wilhelmus Sebastianus Marcus Maria Ketelaars, Carolus Ida Maria Antonius Spee
-
Patent number: 7746375Abstract: A digital camera has a memory and a scan-mode. In this mode, the camera takes a sequence of still pictures. A next one of the pictures in the sequence is selected for being stored in the memory based on an amount of overlap regarding a picture content with a previous one of the pictures stored in the memory. The camera processes the pictures stored in the memory so as to create a composite picture.Type: GrantFiled: October 22, 2004Date of Patent: June 29, 2010Assignee: Koninklijke Philips Electronics N.V.Inventors: Wilhelmus Sebastianus Marcus Maria Ketelaars, Arjen Boogaard
-
Publication number: 20090251674Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: June 4, 2009Publication date: October 8, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard