Abstract: A sputtering apparatus for coating a substrate comprising a first electrode for supporting a target material and a second electrode for supporting a substrate, upon which the coating is deposited. A source of RF power is connected to impose an RF voltage across the electrodes to produce a glow discharge in the space between the electrodes, and shutter means is provided in the space between the electrodes. The shutter means has means for blocking a substantial part of the sputtered atoms from the target electrode glow discharge traveling at or near normal incidence and at least one opening shaped to permit a substantial part of the sputtered atoms from the target electrode traveling at an oblique angle to impinge upon the substrate to produce a thin film coating of the target material.

Abstract: A sputtering system adapted for depositing quartz in uniform thicknesses upon multiple wafers processed in batches including an anode plate having a plurality of wafer locations spaced from the center of the anode, with each wafer location comprising a wafer receiving recess in the anode plate having an angular bottom slope which, in effect, tilts the wafer to an optimum deposition angle with respect to the cathode, depending upon wafer spacing from the center of the anode, to insure uniform deposition across the wafer.